Etching of metals by means of organic radicals Christa HaagHarald Suhr OriginalPaper Pages: 197 - 203
A model of the chemical processes occurring in CF4/O2 discharges used in plasma etching I. C. PlumbK. R. Ryan OriginalPaper Pages: 205 - 230
A model for the etching of Si in CF4 plasmas: Comparison with experimental measurements K. R. RyanI. C. Plumb OriginalPaper Pages: 231 - 246
Gas-phase reactions of SF5, SF2, and SOF with O(3 P): Their significance in plasma processing I. C. PlumbK. R. Ryan OriginalPaper Pages: 247 - 258
Ozone synthesis in charged particle induced noble gas-oxygen and noble gas-oxygen-sulfur hexafluoride discharges H. E. Elsayed-AliG. H. Miley OriginalPaper Pages: 259 - 280
Knudsen effect on plasma-particle mass transfer. I. Formulation and application to self-diffusion Shrikant V. JoshiJin Y. ParkL. S. Richardson OriginalPaper Pages: 281 - 298