Absolute partial and total electron ionization cross sections for CCl4 from threshold up to 180 eV K. LeiterK. StephanT. D. Märk OriginalPaper Pages: 235 - 249
A transparent boron-nitrogen thin film formed by plasma CVD out of the discharge region K. MontasserJ. TamanoS. Morita OriginalPaper Pages: 251 - 260
Chlorine incorporation in silicon films deposited by low-pressure rf discharges in gas mixtures of SiCl4+H2+Ar R. ManoryA. GrillR. Avni OriginalPaper Pages: 261 - 270
Gas-phase reactions of CF2 with O(3P) to produce COF: Their significance in plasma processing K. R. RyanI. C. Plumb OriginalPaper Pages: 271 - 283
Synthesis gas production from peat using a steam plasma P. R. StuartR. J. MunzW. H. Gauvin OriginalPaper Pages: 297 - 313
Calculation of thermodynamic and transport properties of a typical arc furnace plasma H. WilhelmiW. LyhsE. Pfender OriginalPaper Pages: 315 - 323