Gas-phase reactions of CF3 and CF2 with hydrogen atoms: Their significance in plasma processing K. R. RyanI. C. Plumb OriginalPaper Pages: 141 - 146
Plasma chemical vapor deposition of TiN Li ShizhiHuang WuWang Zhongshu OriginalPaper Pages: 147 - 161
Optical emission spectroscopy and actinometry in CCl4-Cl2 radiofrequency discharges Riccardo d'AgostinoFrancesco CramarossaFrancesco Fracassi OriginalPaper Pages: 163 - 178
Titanium dioxide plasma treatment Didier DegoutFayez KassabjiPierre Fauchais OriginalPaper Pages: 179 - 198
Parametric study of the flow and temperature fields in an inductively coupled r.f. plasma torch Javad MostaghimiPierre ProulxMaher I. Boulos OriginalPaper Pages: 199 - 217
Modeling of a free-burning, high-intensity arc at elevated pressures K. C. HsuE. Pfender OriginalPaper Pages: 219 - 234