Radiofrequency plasma decomposition of C n F2n+2-H2 and CF4-C2F4 mixtures during Si etching or fluoropolymer deposition Riccardo d'AgostinoSantolo De BenedictisFrancesco Cramarossa OriginalPaper Pages: 1 - 14
Decomposition of an organophosphorus material in a silent electrical discharge Eugene J. ClothiauxJohn A. KoropchakRobert R. Moore OriginalPaper Pages: 15 - 20
Chemical mechanisms in C3F8-H2 radiofrequency discharges Riccardo d'AgostinoFrancesco CramarossaSantolo De Benedictis OriginalPaper Pages: 21 - 31
Nitriding of titanium with plasma jet under reduced pressure Osamu MatsumotoEiji HayamiYasushi Kanzaki OriginalPaper Pages: 33 - 42
Static pressure and heat flux measurements of a thermal argon plasma flow in a water-cooled tube Masakazu KobayashiTakuya HondaAtsushi Kanzawa OriginalPaper Pages: 43 - 57
Thermal decomposition of carbon dioxide in an argon plasma jet A. HuczkoA. SzymaĆski OriginalPaper Pages: 59 - 72