1. Electrical properties of plasma-polymerized thin organic films

   • Maciej Gazicki
   • H. Yasuda

   OriginalPaper Pages: 279 - 327

2. Kinetic studies of SF₆ plasmas during etching of Si

   • Werner W. Brandt
   • John J. Wagner

   OriginalPaper Pages: 329 - 336

3. Kinetic studies on CF₄ plasmas during etching of Si

   • Werner W. Brandt
   • Paul Roselle

   OriginalPaper Pages: 337 - 342

4. Plasma chemical synthesis. I. Effect of electrode material on the synthesis of ammonia

   • Khin Swe Yin
   • Mundiyath Venugopalan

   OriginalPaper Pages: 343 - 350

5. Behavior of small particles in a thermal plasma flow

   • Xi Chen
   • E. Pfender

   OriginalPaper Pages: 351 - 366