1. Kinetics and mechanism of the decomposition of CS₂, OCS, and SCl₂ in a radiofrequency pulse discharge

   • John E. Nicholas
   • Christopher A. Amodio

   OriginalPaper Pages: 331 - 339

2. Effect of frequency on the deposition of microcrystalline silicon from tetrachlorosilane in low-pressure r.f. plasmas

   • E. Grossman
   • A. Grill
   • R. Avni

   OriginalPaper Pages: 341 - 351

3. The quenching of vibrationally excited N ₂ ⁺ ions by various neutrals

   • W. Dobler
   • F. Howorka
   • W. Lindinger

   OriginalPaper Pages: 353 - 359

4. Operating characteristics and energy distribution in transferred plasma arc systems

   • H. K. Choi
   • W. H. Gauvin

   OriginalPaper Pages: 361 - 386

5. Quenching of air plasma effluents

   • Y. Pang Tsui
   • H. Y. Cheh

   OriginalPaper Pages: 387 - 398

6. Kinetic modelling of the reduction of SiCl₄ in an arc heater for the production of silicon

   • J. F. Coudert
   • E. Bourdin
   • P. Fauchais

   OriginalPaper Pages: 399 - 419

7. Announcements

   Announcement Pages: 421 - 421