Open questions regarding the mechanism of plasma-induced deposition of silicon Stan VepřekMaritza G. J. Vepřek-Heijman OriginalPaper Pages: 323 - 334
He-N2 radiofrequency discharge: Influence of N2 on discharge and afterglow S. De BenedictisG. DilecceC. Gorse OriginalPaper Pages: 335 - 355
Measurement of electron densities by a microwave cavity method in 13.56-MHz RF plasmas of Ar, CF4, C2F6, and CHF3 M. HaverlagG. M. W. KroesenF. J. de Hoog OriginalPaper Pages: 357 - 370
A model for ultrafine powder production in a plasma reactor Pierre ProulxJean-François Bilodeau OriginalPaper Pages: 371 - 386
Diamond synthesis by DC thermal plasma CVD at 1 atm Z. P. LuL. StachowiczE. Pfender OriginalPaper Pages: 387 - 394
Ambipolar diffusion in multicomponent plasmas J. D. RamshawC. H. Chang OriginalPaper Pages: 395 - 402