1. Important announcement

   Announcement Pages: 1 - 1

2. The mechanism of plasma-induced deposition of amorphous silicon from silane

   • S. Vepřek
   • M. Heintze

   OriginalPaper Pages: 3 - 26

3. Mass spectrometric study of SF₆-N₂ plasma during etching of silicon and tungsten

   • Nobuki Mutsukura
   • Guy Turban

   OriginalPaper Pages: 27 - 47

4. Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasma

   • G. M. W. Kroesen
   • D. C. Schram
   • M. J. F. van de Sande

   OriginalPaper Pages: 49 - 69

5. Hydrodynamics and heat transfer in a plasma spouted bed reactor

   • G. Flamant

   OriginalPaper Pages: 71 - 85

6. Numerical simulation of a free-burning argon arc with copper evaporation from the anode

   • G. Y. Zhao
   • M. Dassanayake
   • K. Etemadi

   OriginalPaper Pages: 87 - 98

7. Characteristics of transferred-arc plasmas at high TiCl₄ concentrations

   • P. Tsantrizos
   • W. H. Gauvin

   OriginalPaper Pages: 99 - 113

8. Gas and liquid phases interaction at the FeO·Cr₂O₃ cathode of a direct-current arc discharge

   • H. Lange
   • P. Meubus

   OriginalPaper Pages: 115 - 131

9. The induction plasma chemical reactor: Part I. Equilibrium model

   • G. Y. Zhao
   • J. Mostaghimi
   • M. I. Boulos

   OriginalPaper Pages: 133 - 150

10. The induction plasma chemical reactor: Part II. Kinetic model

    • G. Y. Zhao
    • J. Mostaghimi
    • M. I. Boulos

    OriginalPaper Pages: 151 - 166

11. Modeling of an inductively coupled plasma at reduced pressures

    • S. H. Paik
    • E. Pfender

    OriginalPaper Pages: 167 - 188

12. One-dimensional analysis of the wall region for a multiple-temperature argon plasma

    • Tarit K. Bose

    OriginalPaper Pages: 189 - 206