Abstract
Dimensional metrology based on optical vision systems is commonly used at the industrial level, for example in optical coordinate measurement machines (CMMs). Measurement uncertainties of well below 1 μm are more and more required. Thus for calibration samples a measurement uncertainty of the order of 100 nm is required. To enable accurate and traceable measurements both unidirectional (e. g. distance) measurements and bidirectional measurements (e. g. width or diameter) have to be performed for system calibrations and the reverification of the performance [1]. However, up to now the national metrology institutes (NMIs) are not able to offer internationally recognized bidirectional calibrations, which are covered by the Mutual Recognition agreement (MRA [2]) and documented in the key comparison database [3]. Currently only one NMI offers optical widths calibrations on suitable user-supplied samples, including line scales, as well.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Geom. Product Specifications Acceptance and Reverification tests for CMMs (ISO 10360)
Mutual Recognition Agreement, http://www.bipm.org/en/cipm-mra/
Key comparison data base, http://kcdb.bipm.org/appendixB/KCDB_ApB_search.asp
NPL good practice guide no 39
Carmignato, S., et al.: Metrological performance of optical coordinate measuring machines under industrial conditions. Annals of the CIRP 59, 497–500 (2010)
Richter, J., et al.: Calibration of CD mask standards for the 65 nm node: CoG and MoSi. In: Proc. SPIE, vol. 6533, p. 6533-536.4 (2007)
Bodermann, B., Buhr, E., Li, Z., Bosse, H.: Quantitative optical microscopy at the nanoscale: new developments and comparisons. In: Osten, W. (ed.) Optical Imaging and Metrology: Advanced Technologies, pp. 255–282 (2012) ISBN 978-3-527-41064-4
Ehret, G., et al.: Theoretical modelling and experimental verification of the influence of Cr edge profiles on microscopic-optical edge signals for COG masks. In: Proc. SPIE, vol. 6349 (2006)
Bodermann, B., Buhr, E., Ehret, G., Scholze, F., Wurm, M.: Optical metrology of micro- and nanostructures at PTB: Status and future developments. In: Proc. SPIE, vol. 7155, p. 71550V (2008)
Totzeck, M.: Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields. Optik 9, 399–406 (2001)
Bodermann, B., Ehret, G.: Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation. In: Proc. SPIE, vol. 5858, pp. 09-1–09-12 (2005)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2014 Springer-Verlag Berlin Heidelberg
About this paper
Cite this paper
Bodermann, B., Köning, R., Bergmann, D., Häßler-Grohne, W., Flügge, J., Bosse, H. (2014). The Road towards Accurate Optical Width Measurements at the Industrial Level. In: Osten, W. (eds) Fringe 2013. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-36359-7_4
Download citation
DOI: https://doi.org/10.1007/978-3-642-36359-7_4
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-36358-0
Online ISBN: 978-3-642-36359-7
eBook Packages: EngineeringEngineering (R0)