Abstract
Wide-bandgap II–VI compounds are been applied to optoelectronic devices, especially light-emitting devices in the short-wavelength region of visible light, because of their direct gap and suitable bandgap energies. Many methods have been extensively applied to grow high-quality films and bulk single crystals from the vapor and liquid phases.
This chapter firstly discusses the basic properties and phase diagrams of wide-bandgap II–VI compounds such as ZnS, ZnO, ZnSe, ZnTe, CdSe and CdTe. Then the growth methods and recent progress in films and bulk crystal growth are reviewed. In the epitaxial growth methods, the focus is on liquid-phase epitaxy (GlossaryTerm
LPE
), vapor-phase epitaxy (GlossaryTermVPE
) containing conventional VPE, hot-wall epitaxy (GlossaryTermHWE
), metalorganic chemical vapor deposition (GlossaryTermMOCVD
) or metalorganic phase epitaxy (GlossaryTermMOVPE
), molecular-beam epitaxy (GlossaryTermMBE
) and atomic-layer epitaxy (GlossaryTermALE
). In bulk crystal growth, two typical growth methods, chemical/physical vapor transport (GlossaryTermCVT
/GlossaryTermPVT
) and Bridgman techniques, are introduced.Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
A. Lopez-Otero: Thin Solid Films 49, 1 (1978)
H.M. Manasevit, W.I. Simpson: J. Electrochem. Soc. 118, 644 (1971)
L.L. Chang, R. Ludeke: In: Epitaxial Growth, Part A, ed. by J.W. Matthews (Academic, New York 1975) p. 37
E. Veuhoff, W. Pletschen, P. Balk, H. Luth: J. Cryst. Growth 55, 30 (1981)
T. Suntola: Mater. Sci. Rep. 4, 261 (1989)
M.M. Faktor, R. Heckingbottom, I. Garrett: J. Cryst. Growth 9, 3 (1971)
I. Kikuma, M. Furukoshi: J. Cryst. Growth 41, 103 (1977)
Y.V. Korostelin, V.J. Kozlovskij, A.S. Nasibov, P.V. Shapkin: J. Cryst. Growth 159, 181 (1996)
J.F. Wang, A. Omino, M. Isshiki: Mater. Sci. Eng. 83, 185 (2001)
S.H. Song, J.F. Wang, G.M. Lalev, L. He, M. Isshiki: J. Cryst. Growth 252, 102 (2003)
H. Harmann, R. Mach, B. Sell: In: Current Topics Materials Science, Vol. 9, ed. by E. Kaldis (North-Holland, Amsterdam 1982) p. 1
P. Rudolph, N. Schäfer, T. Fukuda: Mater. Sci. Eng. 15, 85 (1995)
R. Shetty, R. Balasubramanian, W.R. Wilcox: J. Cryst. Growth 100, 51 (1990)
K.W. Böer: Survey of Semiconductor Physics, Vol. 1: Electrons and Other Particles in Bulk Semiconductors (Van Nostrand, New York 1990)
C.M. Wolf, N. Holonyak, G.E. Stillman: Physical Properties of Semiconductors (Prentice Hall, New York 1989)
L. Smart, E. Moore: Solid State Chemistry, 2nd edn. (Chapman Hall, New York 1995)
E. Lide (Ed.): Handbook of Chemistry and Physics, 2nd edn. (CRC, Boca Raton 1973)
J. Singh: Physics of Semiconductors and Their Heterostructures (McGraw–Hill, New York 1993)
N. Yamamoto, H. Horinaka, T. Miyauchi: Jpn. J. Appl. Phys. 18, 225 (1997)
H. Neumann: Kristall Technik 15, 849 (1980)
J. Camassel, D. Auvergne, H. Mathieu: J. Phys. Colloq. 35, C3–67 (1974)
W. Shan, J.J. Song, H. Luo, J.K. Furdyna: Phys. Rev. 50, 8012 (1994)
K.A. Dmitrenko, S.G. Shevel, L.V. Taranenko, A.V. Marintchenko: Phys. Status Solidi B 134, 605 (1986)
S. Logothetidis, M. Cardona, P. Lautenschlager, M. Garriga: Phys. Rev. B 34, 2458 (1986)
R.C. Sharma, Y.A. Chang: J. Cryst. Growth 88, 192 (1988)
H. Okada, T. Kawanaka, S. Ohmoto: J. Cryst. Growth 165, 31 (1996)
N.K. Abrikosov, V.F. Bankina, L.B. Poretzkaya, E.V. Skudnova, S.N. Chichevskaya: Poluprovodnikovye chalkogenidy i splavy na ikh osnovje (Nauka, Moscow 1975) (in Russian)
R.F. Brebrick: J. Cryst. Growth 86, 39 (1988)
M.R. Lorenz: In: Physics and Chemistry of II–VI Compounds, ed. by M. Aven, J.S. Prener (North Holland, Amsterdam 1967) p. 210
T. Yao: Optoelectron. Dev. Technol. 6, 37 (1991)
H. Nakamura, M. Aoki: Jpn. J. Appl. Phys. 20, 11 (1981)
C. Werkhoven, B.J. Fitzpatrik, S.P. Herko, R.N. Bhargave, P.J. Dean: Appl. Phys. Lett. 38, 540 (1981)
H. Nakamura, S. Kojima, M. Wasgiyama, M. Aoki: Jpn. J. Appl. Phys. 23, L617 (1984)
V.M. Skobeeva, V.V. Serdyuk, L.N. Semenyuk, N.V. Malishin: J. Appl. Spectrosc. 44, 164 (1986)
P. Lilley, P.L. Jones, C.N.W. Litting: J. Mater. Sci. 5, 891 (1970)
T. Matsumoto, T. Morita, T. Ishida: J. Cryst. Growth 53, 225 (1987)
S. Zhang, H. Kinto, T. Yatabe, S. Iida: J. Cryst. Growth 86, 372 (1988)
S. Iida, T. Yatabe, H. Kinto: Jpn. J. Appl. Phys. 28, L535 (1989)
P. Besomi, B.W. Wessels: J. Cryst. Growth 55, 477 (1981)
T. Kyotani, M. Isshiki, K. Masumoto: J. Electrochem. Soc. 136, 2376 (1989)
N. Stucheli, E. Bucher: J. Electron. Mater. 18, 105 (1989)
M. Nishio, Y. Nakamura, H. Ogawa: Jpn. J. Appl. Phys. 22, 1101 (1983)
N. Lovergine, R. Cingolani, A.M. Mancini, M. Ferrara: J. Cryst. Growth 118, 304 (1992)
O. De Melo, E. Sánchez, S. De Roux, F. Rábago-Bernal: Mater. Chem. Phys. 59, 120 (1999)
M. Kasuga, H. Futami, Y. Iba: J. Cryst. Growth 115, 711 (1991)
J.F. Wang, K. Kikuchi, B.H. Koo, Y. Ishikawa, W. Uchida, M. Isshiki: J. Cryst. Growth 187, 373 (1998)
J. Humenberger, G. Linnet, K. Lischka: Thin Solid Films 121, 75 (1984)
F. Sasaki, T. Mishina, Y. Masumoto: J. Cryst. Growth 117, 768 (1992)
B.J. Kim, J.F. Wang, Y. Ishikawa, S. Sato, M. Isshiki: Phys. Stat. Sol. (a) 191, 161 (2002)
A. Rogalski, J. Piotrowski: Prog. Quantum Electron. 12, 87 (1988)
G.M. Lalev, J. Wang, S. Abe, K. Masumoto, M. Isshiki: J. Crystal Growth 256, 20 (2003)
H.M. Manasevit: Appl. Phys. Lett. 12, 1530 (1968)
S. Fujita, M. Isemura, T. Sakamoto, N. Yoshimura: J. Cryst. Growth 86, 263 (1988)
H. Mitsuhashi, I. Mitsuishi, H. Kukimoto: J. Cryst. Growth 77, 219 (1986)
P.J. Wright, P.J. Parbrook, B. Cockayne, A.C. Jones, E.D. Orrell, K.P. O’Donnell, B. Henderson: J. Cryst. Growth 94, 441 (1989)
S. Hirata, M. Isemura, S. Fujita, S. Fujita: J. Cryst. Growth 104, 521 (1990)
S. Nishimura, N. Iwasa, M. Senoh, T. Mukai: Jpn. J. Appl. Phys. 32, L425 (1993)
K.P. Giapis, K.F. Jensen, J.E. Potts, S.J. Pachuta: Appl. Phys. Lett. 55, 463 (1989)
S.J. Pachuta, K.F. Jensen, S.P. Giapis: J. Cryst. Growth 107, 390 (1991)
M. Danek, J.S. Huh, L. Foley, K.F. Jenson: J. Cryst. Growth 145, 530 (1994)
W. Kuhn, A. Naumov, H. Stanzl, S. Bauer, K. Wolf, H.P. Wagner, W. Gebhardt, U.W. Pohl, A. Krost, W. Richter, U. Dümichen, K.H. Thiele: J. Cryst. Growth 123, 605 (1992)
J.K. Menno, J.W. Kerri, F.H. Robert: J. Phys. Chem. B 101, 4882 (1997)
H.P. Wagner, W. Kuhn, W. Gebhardt: J. Cryst. Growth 101, 199 (1990)
Taskar, B.A. Khan, D.R. Dorman, K. Shahzad: Appl. Phys. Lett. 62, 270 (1993)
Y. Fujita, T. Terada, T. Suzuki: Jpn. J. Appl. Phys. 34, L1034 (1995)
J. Wang, T. Miki, A. Omino, K.S. Park, M. Isshiki: J. Cryst. Growth 221, 393 (2000)
M.K. Lee, M.Y. Yeh, S.J. Guo, H.D. Huang: J. Appl. Phys. 75, 7821 (1994)
A. Toda, T. Margalith, D. Imanishi, K. Yanashima, A. Ishibashi: Electron. Lett. 31, 1921 (1995)
A. Cho: J. Vac. Sci. Tech. 8, S31 (1971)
C.T. Foxon: J. Cryst. Growth 251, 130 (2003)
T. Yao: In: The Technology and Physics of Molecular Beam Epitaxy, ed. by E.H.C. Parker (Plenum, New York 1985) p. 313, Chap. 10
E. Veuhoff, W. Pletschen, P. Balk, H. Luth: J. Cryst. Growth 55, 30 (1981)
M.B. Panish, S. Sumski: J. Appl. Phys. 55, 3571 (1984)
Y.P. Chen, G. Brill, N.K. Dhar: J. Cryst. Growth 252, 270 (2003)
H. Kato, M. Sano, K. Miyamoto, T. Yao: J. Cryst. Growth 237--239, 538 (2002)
M. Imaizumi, M. Adachi, Y. Fujii, Y. Hayashi, T. Soga, T. Jimbo, M. Umeno: J. Cryst. Growth 221, 688 (2000)
W. Xie, D.C. Grillo, M. Kobayashi, R.L. Gunshor, G.C. Hua, N. Otsuka, H. Jeon, J. Ding, A.V. Nurmikko: Appl. Phys. Lett. 60, 463 (1992)
S. Guha, A. Madhukar, K.C. Rajkumar: Appl. Phys. Lett. 57, 2110 (1990)
E. Bauer, J.H. van der Merwe: Phys. Rev. B 33, 3657 (1986)
J. Drucker, S. Chapparro: Appl. Phys. Lett. 71, 614 (1997)
S.H. Xin, P.D. Wang, A. Yin, C. Kim, M. Dobrowolska, J.L. Merz, J.K. Furdyna: Appl. Phys. Lett. 69, 3884 (1996)
M.C. Harris Liao, Y.H. Chang, Y.H. Chen, J.W. Hsu, J.M. Lin, W.C. Chou: Appl. Phys. Lett. 70, 2256 (1997)
Y. Terai, S. Kuroda, K. Takita, T. Okuno, Y. Masumoto: Appl. Phys. Lett. 73, 3757 (1998)
M. Kobayashi, S. Nakamura, K. Wakao, A. Yoshikawa, K. Takahashi: J. Vac. Sci. Technol. B 16, 1316 (1998)
S.O. Ferreira, E.C. Paiva, G.N. Fontes, B.R.A. Neves: J. Appl. Phys. 93, 1195 (2003)
M.A. Herman, J.T. Sadowski: Cryst. Res. Technol. 34, 153 (1999)
M. Ahonen, M. Pessa, T. Suntola: Thin Solid Films 65, 301 (1980)
M. Ritala, M. Leskelä: Nanotechnology 10, 19 (1999)
H. Hartmann: J. Cryst. Growth 42, 144 (1977)
M. Shiloh, J. Gutman: J. Cryst. Growth 11, 105 (1971)
S. Hassani, A. Tromson-Carli, A. Lusson, G. Didier, R. Triboulet: Phys. Stat. Sol. (b) 229, 835 (2002)
W.W. Piper, S.J. Polich: J. Appl. Phys. 32, 1278 (1961)
A.C. Prior: J. Electrochem. Soc. 108, 106 (1961)
T. Kiyosawa, K. Igaki, N. Ohashi: Trans. Jpn. Inst. Metala 13, 248 (1972)
T. Ohno, K. Kurisu, T. Taguchi: J. Cryst. Growth 99, 737 (1990)
M. Isshiki, T. Tomizono, T. Yoshita, T. Ohkawa, K. Igaki: J. Jpn. Inst. Metals 48, 1176 (1984)
X.M. Huang, K. Igaki: J. Cryst. Growth 78, 24 (1986)
M. Isshiki, T. Yoshita, K. Igaki, W. Uchida, S. Suto: J. Cryst. Growth 72, 162 (1985)
M. Isshiki: J. Cryst. Growth 86, 615 (1988)
T. Ohyama, E. Otsuka, T. Yoshita, M. Isshiki, K. Igaki: Jpn. J Appl. Phys. 23, L382 (1984)
T. Ohyama, K. Sakakibara, E. Otsuka, M. Isshiki, K. Igaki: Phys. Rev. B 37, 6153 (1988)
Y.M. Tairov, V.F. Tsvetkov: J. Cryst. Growth 43, 209 (1978)
G. Cantwell, W.C. Harsch, H.L. Cotal, B.G. Markey, S.W.S. McKeever, J.E. Thomas: J. Appl. Phys. 71, 2931 (1992)
V. Yu, Korostelin, V.I. Kozlovsky, A.S. Nasibov, P.V. Shapkin: J. Cryst. Growth 161, 51 (1996)
S. Fujita, H. Mimoto, H. Takebe, T. Noguchi: J. Cryst. Growth 47, 326 (1979)
K. Byrappa: In: Hydrothermal Growth of Crystal, ed. by K. Byrappa (Pergamon, Oxford 1991)
A.C. Walker: J. Am. Ceram. Soc. 36, 250 (1953)
R.A. Laudice, E.D. Kolg, A.J. Caporaso: J. Am. Ceram. Soc. 47, 9 (1964)
M. Suscavage, M. Harris, D. Bliss, P. Yip, S.-Q. Wang, D. Schwall, L. Bouthillette, J. Bailey, M. Callahan, D.C. Look, D.C. Reynolds, R.L. Jones, C.W. Litton: MRS Internet J. Nitride Semicond. Res. 4S1, G3.40 (1999)
L.N. Demianets, D.V. Kostomarov: Ann. Chim. Sci. Mater. 26, 193 (2001)
N. Ohashi, T. Ohgaki, T. Nakata, T. Tsurumi, T. Sekiguchi, H. Haneda, J. Tanaka: J. Kor. Phys. Soc. 35, S287 (1999)
D.C. Look, D.C. Reynolds, J.R. Sizelove, R.L. Jones, C.W. Litton, G. Gantwell, W.C. Harsch: Solid State Commun. 105, 399 (1988)
T. Sekiguchi, S. Miyashita, K. Obara, T. Shishido, N. Sakagami: J. Cryst. Growth 214/215, 72 (2000)
P. Höschl, M. Yu, Ivanov, E. Belas, J. Franc, R. Grill, D. Hlidek, P. Moravec, M. Zvara, H. Sitter, A. Toth: J. Cryst. Growth 184/185, 1039 (1998)
T. Fukuda, K. Umetsu, P. Rudolph, H.J. Koh, S. Iida, H. Uchiki, N. Tsuboi: J. Cryst. Growth 161, 45 (1996)
A. Omino, T. Suzuki: J. Cryst. Growth 117, 80 (1992)
I. Kikuma, M. Furukoshi: J. Cryst. Growth 71, 136 (1985)
J.F. Wang, A. Omino, M. Isshiki: J. Cryst. Growth 214/215, 875 (2000)
J. Wang, A. Omino, M. Isshiki: J. Cryst. Growth 229, 69 (2001)
J.F. Wang, A. Omino, M. Isshiki: Mater. Sci. Eng. B 83, 185 (2001)
P. Rudolph, N. Schäfer, T. Fukuda: Mater. Sci. Eng. R 15, 85 (1995)
T. Asahi, A. Arakawa, K. Sato: J. Cryst. Growth 229, 74 (2001)
M. Ohmori, Y. Iwase, R. Ohno: Mater. Sci. Eng. B 16, 283 (1999)
R. Triboulet: Prog. Cryst. Growth Char. Mater. 128, 85 (1994)
H.H. Woodbury, R.S. Lewandowski: J. Cryst. Growth 10, 6 (1971)
R. Triboulet: Cryst. Res. Technol. 38, 215 (2003)
T. Asahi, T. Yabe, K. Sato: The Japan Society of Applied Physics and Related Societies, Extended Abstracts, The 50th Spring Meeting, (2003) p. 332
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2017 Springer International Publishing AG
About this chapter
Cite this chapter
Isshiki, M., Wang, J. (2017). Wide-Bandgap II-VI Semiconductors: Growth and Properties. In: Kasap, S., Capper, P. (eds) Springer Handbook of Electronic and Photonic Materials. Springer Handbooks. Springer, Cham. https://doi.org/10.1007/978-3-319-48933-9_16
Download citation
DOI: https://doi.org/10.1007/978-3-319-48933-9_16
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-48931-5
Online ISBN: 978-3-319-48933-9
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)