Abstract
Pb(ZrxT1-x)O3 (or PZT) thin films have been deposited on [110] LiTaO3 single crystal substrates by radio frequency magnetron sputtering using a ceramic target with excess PbO. Highly oriented [101] PZT thin films were obtained when the as-deposited thin films were annealed at 650°C for 60 min in an oxygen ambient, and a well-developed grain structure was formed. The optical properties of these thin films were also studied.
Keywords
- Pulse Laser Deposition
- Metalorganic Chemical Vapor Deposition
- Radio Frequency Magnetron
- Ceramic Target
- Radio Frequency Magnetron Sputtering
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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© 1997 Springer Science+Business Media New York
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Lu, D.X., Wong, E.M.W., Pun, E.Y.B., Chung, P.S., Jia, G.C. (1997). PZT Thin Films by Radio Frequency Magnetron Sputtering. In: Lampropoulos, G.A., Lessard, R.A. (eds) Applications of Photonic Technology 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-9250-8_9
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DOI: https://doi.org/10.1007/978-1-4757-9250-8_9
Publisher Name: Springer, Boston, MA
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