Modeling Chemical Vapor Deposition and Atomic Layer Deposition

Articles (10 in this collection)

1. Studying chemical vapor deposition processes with theoretical chemistry

   Authors

   • Henrik Pedersen
   • Simon D. Elliott

   • Content type: Overview
   • Published: 18 March 2014

   • Article: 1476

   

2. A Markov chain approach to simulate Atomic Layer Deposition chemistry and transport inside nanostructured substrates

   Authors

   • Angel Yanguas-Gil
   • Jeffrey W. Elam

   • Content type: Regular Article
   • Published: 26 February 2014

   • Article: 1465

   

3. A theoretical study of possible point defects incorporated into α-alumina deposited by chemical vapor deposition

   Authors (first, second and last of 6)

   • C. Århammar
   • F. Silvearv
   • R. Ahuja

   • Content type: Regular Article
   • Published: 27 December 2013

   • Article: 1433

   

4. Effect of CVD diamond growth by doping with nitrogen

   Authors

   • Z. Yiming
   • F. Larsson
   • K. Larsson

   • Content type: Regular Article
   • Open Access
   • Published: 15 December 2013

   • Article: 1432

   

5. CFD modeling of the high-temperature HVPE growth of aluminum nitride layers on c-plane sapphire: from theoretical chemistry to process evaluation

   Authors (first, second and last of 8)

   • R. Boichot
   • N. Coudurier
   • M. Pons

   • Content type: Regular Article
   • Published: 29 November 2013

   • Article: 1419

   

6. Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure

   Authors

   • Curtisha D. Travis
   • Raymond A. Adomaitis

   • Content type: Regular Article
   • Published: 26 November 2013

   • Article: 1414

   

7. Copper(I) carbene hydride complexes acting both as reducing agent and precursor for Cu ALD: a study through density functional theory

   Authors

   • Gangotri Dey
   • Simon D. Elliott

   • Content type: Regular Article
   • Published: 14 November 2013

   • Article: 1416

   

8. Computational investigation of surface reactivity of functionalized silicon surfaces in deposition processes

   Authors

   • Jia-Ming Lin
   • Andrew V. Teplyakov

   • Content type: Regular Article
   • Published: 17 October 2013

   • Article: 1404

   

9. Adsorption and surface diffusion of silicon growth species in silicon carbide chemical vapour deposition processes studied by quantum-chemical computations

   Authors (first, second and last of 4)

   • Emil Kalered
   • Henrik Pedersen
   • Lars Ojamäe

   • Content type: Regular Article
   • Published: 16 October 2013

   • Article: 1403

   

10. Shortcomings of CVD modeling of SiC today

    Authors (first, second and last of 5)

    • Ö. Danielsson
    • P. Sukkaew
    • E. Janzén

    • Content type: Regular Article
    • Published: 01 October 2013

    • Article: 1398