Very thin films of symmetric diblock copolymers

Abstract

The morphology of thin films of symmetric diblock copolymers has been investigated by neutron and X-ray reflectivity and X-ray photoelectron spectroscopy, for thicknesses less than 3L/2, where L is the long period of the lamellar morphology in the bulk. The constrains placed on a copolymer film by the presence of the two surfaces can produce severe perturbations on the morphology, due to the interactions of the copolymer blocks with the air and the substrate interfaces. It is possible to induce variations in the chain extension and in the interfacial mixing, and to force a normally microphase separated copolymer into a homogenecous state.