Abstract
Radiation chemical processes in poly(methacrylate) and chlorinated polyphenylmethacrylate after ion- and electron-beam irradiation are analyzed by means of TL- and ESCA-measurements. The results are in accordance with proposed models for degradation and crosslinking mechanisms of the polymers. A correlation is found between the TL intensity and the sensitivity of positive resists based on poly(methacrylates).
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© 1998 Dr. Dietrich Steinkopff Verlag GmbH & Co. KG
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Kunze, R., Wäsche, M., Linke, E. (1998). Thermoluminescence and ESCA investigations in polymer resist layers. In: Chudáček, I. (eds) Relationships of Polymeric Structure and Properties. Progress in Colloid & Polymer Science, vol 78. Steinkopff. https://doi.org/10.1007/BFb0114356
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DOI: https://doi.org/10.1007/BFb0114356
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Print ISBN: 978-3-7985-0779-1
Online ISBN: 978-3-7985-1691-5
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