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Thermoluminescence and ESCA investigations in polymer resist layers

  • R. Kunze
  • M Wäsche
  • E. Linke
Conference paper
Part of the Progress in Colloid & Polymer Science book series (PROGCOLLOID, volume 78)

Abstract

Radiation chemical processes in poly(methacrylate) and chlorinated polyphenylmethacrylate after ion- and electron-beam irradiation are analyzed by means of TL- and ESCA-measurements. The results are in accordance with proposed models for degradation and crosslinking mechanisms of the polymers. A correlation is found between the TL intensity and the sensitivity of positive resists based on poly(methacrylates).

Key words

Polymer resist layers polymethacrylate chlorinated phenylmethacrylate thermoluminescence 

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Copyright information

© Dr. Dietrich Steinkopff Verlag GmbH & Co. KG 1998

Authors and Affiliations

  • R. Kunze
    • 1
  • M Wäsche
    • 1
  • E. Linke
    • 1
  1. 1.Akademie der Wissenschaften der DDRZentralinstitut für physikalische ChemieBerlinG.D.R.

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