Thermoluminescence and ESCA investigations in polymer resist layers
Radiation chemical processes in poly(methacrylate) and chlorinated polyphenylmethacrylate after ion- and electron-beam irradiation are analyzed by means of TL- and ESCA-measurements. The results are in accordance with proposed models for degradation and crosslinking mechanisms of the polymers. A correlation is found between the TL intensity and the sensitivity of positive resists based on poly(methacrylates).
Key wordsPolymer resist layers polymethacrylate chlorinated phenylmethacrylate thermoluminescence
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