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The application of ion implantation to semiconductor devices

  • Part II. Invited Papers of the European Meeting of the IEEE
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Festkörperprobleme 9

Part of the book series: Advances in Solid State Physics ((ASSP,volume 9))

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Author information

Authors and Affiliations

  1. Services Electronics Research Laboratories, Baldock, Hertfordshire, England

    L. N. Large & K. G. Hambleton

Authors
  1. L. N. Large
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  2. K. G. Hambleton
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Editor information

O. Madelung

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© 1969 Friedr. Vieweg + Sohn GmbH, Verlag

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Large, L.N., Hambleton, K.G. (1969). The application of ion implantation to semiconductor devices. In: Madelung, O. (eds) Festkörperprobleme 9. Advances in Solid State Physics, vol 9. Springer, Berlin, Heidelberg. https://doi.org/10.1007/BFb0109160

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  • DOI: https://doi.org/10.1007/BFb0109160

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  • Print ISBN: 978-3-540-75325-4

  • Online ISBN: 978-3-540-75326-1

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