Abstract
EL2, the dominant deep defect in undoped as-grown GaAs has attracted tremendous interest because of its peculiar optical properties and because of its technological importance for the growth of undoped semi-insulating GaAs. This paper first outlines the photoelectronic and optical properties of EL2. The second part describes the optical properties of the AsGa antisite defect as inferred from magnetic resonance combined with optical techniques. A comparison of the data demonstrates that EL2 and the AsGa antisite as defined by its electron-spin-resonance (ESR) behavior in undoped as-grown GaAs have the same optical properties. At present this fact is the most direct and convincing evidence that EL2 is the AsGa antisite seen by ESR and related techniques. Whether this antisite is an isolated defect or a complex with an arsenic interstitial is a highly controversial question.
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References
G.M. Martin and S. Makram-Ebeid in: “Deep Centers in Semiconductors” Ed. S.T. Pantelides (Gordon and Breach, 1986) pp. 389
A.M. Huber, N.T. Linh, M. Valladon, J.C. Debrun, G.M. Martin, A. Mitonneau and A. Mircea, J. Appl. Phys. 50, 4022 (1979)
D. Bois and G. Vincent, J. Physique 38, L351 (1977)
G. Vincent and D. Bois, Solid State Commun. 27, 431 (1978)
G.M. Martin, J.P. Farges, G. Jacob, J.P. Hallais and G. Poiblaud, J. Appl. Phys. 51, 2840 (1980)
H. Lessoff private communication 1980
With one exception AsGa/EL2 data obtained for plastically deformed or particle irradiated material are not considered here.
When speaking of the AsGa antisite the author refers to the defect that gives rise to the AsGa+ electron-spin-resonance spectrum in as-grown undoped GaAs. It is left as an open question whether this is isolated AsGa or AsGa complexed with an As interstitial.
D. Bois and A. Chantre, Revue Phys. Appliquée 15, 631 (1980)
A. Chantre, G. Vincent and D. Bois, Phys. Rev. B23, 5335 (1981)
P. Silverberg, P. Omling and L. Samuelson, Appl. Phys. Lett. 52, 1689 (1988)
G.L. Miller, D.V. Lang and L.C. Kimerling, Ann. Review Mater. Sci. 1977 pp. 377
Other conclusions are possible but lead to contradictions.
G. Vincent, D. Bois and A. Chantre, J. Appl. Phys. 53, 3643 (1982)
A partial or even complete optical recovery has been reported in Refs. 16–20. However it is not clear whether this is a direct optical effect or an indirect one induced by optically generated free carriers, see, Ref. 21. A. Mitonneau and A. Mircea, Solid State Commun. 30 157 (1979). The effect described in this paper, also referred to as Auger deexcitation, is not well understood. One could speculate that neutral EL2* captures an electron and that the thermal barrier for the decay of negative EL2* is much smaller than that of neutral EL2*. Thus instable EL2− could form which by emitting an electron could form EL20. This hypothetical sequence would be an Auger-type process.
M. Tajima, Japanese J. Appl. Phys. 24, L47 (1985)
H.J.v. Bardeleben, N.T. Bagraev and J.C. Bourgoin, Appl. Phys. Lett. 51, 1451 (1987)
D.W. Fischer, Appl. Phys. Lett. 50, 1751 (1987)
M. Tajima, H. Saito, T. Iino and K. Ishida, Japanese J. Appl. Phys. 27, L101 (1988)
J.C. Parker and R. Bray, Phys. Rev. B 37, 6368 (1988)
A. Mitonneau and A. Mircea, Solid State Commun. 30, 157 (1979). The effect described in this paper, also referred to as Auger deexcitation, is not well understood. One could speculate that neutrla EL2* captures an electron and that the thermal barrier for the decay of negative EL2* is much smaller than that of neutral EL2*. Thus instable EL2− could form which by emitting an electron could form EL20. This hypothetical sequence would be an Auger-type process.
F. Fuchs and B. Dischler, Appl. Phys. Lett. 51, 679 (1987)
P. Trautmann, M. Kaminska and J.M. Baranowski, Acta Phys. Pol. A71, 269 (1987)
M. Skowronskio, J. Lagowski and H.C. Gatos, Phys. Rev. B 32, 4264 (1985)
Y. Mochizuko and T. Ikoma in “Semi-Insulating III–V Materials” Eds. H. Kukimoto, S. Miyazawa (Ohmsha, 1986) pp. 323.
M. Levinson and J.A. Kafalas, Phys. Rev. B 35, (1987)
J. Lagowski, D.G. Lin, T.P. Chen, M. Skowronski and H.C. Gatos, Appl. Phys. Lett. 47, 929 (1985)
J. Osaka, H. Okamoto and K. Kobayashi, “Semi-Insulating III–V Materials” Eds. H. Kukimoto, S. Miyazawa (Ohmsha, 1986) pp. 421
A. Bencherifa, G. Brémond, A. Nouaihat, G. Guillot, A. Guivarch and A. Regreny, Revue Phys. Appliquée 22, 891 (1987)
T. Wosinski, Appl. Phys. A 36, 213 (1985)
P. Omling, P. Silverberg and L. Samuelson, Phys. Rev. B 38, 3606 (1988)
P. Silverberg, P. Omling and L. Samuelson in “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) pp. 369
M.D. Sturge, Phys. Rev. 127, 768 (1962)
G.M. Martin, Appl. Phys. Lett. 39, 747 (1981)
B. Dischler, F. Fuchs and U. Kaufmann, Appl. Phys. Lett. 48, 1282 (1986)
F. Fuchs, B. Dischler and U. Kaufmann in “Semi-Insulating III–V Materials” Eds. H. Kukimoto, S. Miyazawa (Ohmsha, 1986) pp. 329
“Defect Recognition and Image Processing in III–V Compounds” Ed. J.P. Fillard (Elsevier, 1985)
“Defect Recognition and Image Processing in III–V Compounds” Ed. E.R. Weber (Elsevier, 1987)
M. Kaminska, M. Skowronski, J. Lagowski, J.M. Parsey and H.C. Gatos, Appl. Phys. Lett. 43, 302 (1983)
F. Fuchs and B. Dischler, Appl. Phys. Lett. 51, 2115 (1987)
N. Tsukada, T. Kikuta and K. Ishida, Japanese J. Appl. Phys. 24, L302 (1985)
N. Tsukada, T. Kikuta and K. Ishida, Japanese J. Appl. Phys. 25, L196 (1986)
Here it is assumed that after autoionization of EL20, the electron recombines with EL2+ within a time shorter than a nanosecond, see Ref. 44. W.W. Rühle, K. Leo and N.M. Haegel, “GaAs and Related Compounds 1987” Eds. A. Christou and H.S. Rupprecht, Inst. Phys. Conf. Ser. 91, 105 (1988). Thus EL20 is immediately available for the next absorption cycle.
W.W. Rühle, K. Leo and N.M. Haegel, “GaAs and Related Compounds 1987” Eds. A. Christou and H.S. Rupprecht, Inst. Phys. Conf. Ser. 91, 105 (1988)
W. Kuszko and M. Kaminska, Acta Phys. Pol. A69, 427 (1986)
F. Fuchs and B. Dischler, private communication
M. Skowronski, D.G. Lin, J. Lagowski, M.L. Pawlowicz, K.Y. Ko and H.C. Gatos, Mat. Res. Soc. Proc. 46, 207 (1985)
M.O. Manasreh and B.C. Covington, Phys. Rev. B 35, 2524 (1987)
M.O. Manasreh and B.C. Covington, Phys. Rev. B 36, 2730 (1987)
K. Bergman, P. Omling, L. Samuelson and H.G. Grimmeiss in “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) p. 397
W. Kuszko, M. Jezewski, J.M. Baranowski and M. Kaminska, Appl. Phys. Lett. 53 2558 (1988)
M. Kaminska, M. Skowronski and W. Kuszko, Phys. Rev. Lett. 55, 2204 (1985)
T. Figielski and T. Wosinski, Phys. Rev. B 36, 1269 (1987)
H. Ennen, U. Kaufmann and J. Schneider, Appl. Phys. Lett. 38, 355 (1981)
W. Kuszko, P.J. Walczak, P. Trautman, M. Kaminska and J.M. Baranowski, “Defects in Semiconductors” Ed. H.J.v. Bardeleben (trans Tech, 1986) Materials Science Forum Vols. 10–12. pp. 317
J. Dabrowski and M. Scheffler, Phys. Rev. Lett. 60, 2183 (1988)
D.J. Chadi and K.J. Chang, Phys. Rev. Lett. 60, 2187 (1988)
Landolt-Börnstein, New Series, Ed. M. Schulz (Springer, 1989) Vol. 22b
M. Tajima in “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) pp. 119
M. Tajima, Japanese J. Appl. Phys. 26, L885 (1987)
M. Tajima, T. Iino and K. Ishida, Japanese J. Appl. Phys. 26, L1060 (1987)
J.A. van Vechten, J. Electrochem. Soc. 122, 423 (1975)
K. Chino, T. Kazuno, K. Satoh and M. Kubota in “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) pp. 133
T.A. Kennedy, N.D. Wilsey, P.B. Klein and R.L. Henry, Materials Science Forum Vols. 10–12, 271 (1986)
R.J. Wagner, J.J. Krebs, G.M. Stauss and A.M. White, Solid State Commun. 36, 15 (1980)
J.R. Morton and K.F. Preston, J. Magn. Reson. 30, 577 (1978)
U. Kaufmann and J. Schneider in: “Festkörperprobleme XX, adv. in Solid State Physics”, Ed. J. Treusch (Vieweg, 1980) pp. 87
U. Kaufmann, J. Schneider and A. Räuber, Appl. Phys. Lett. 29, 312 (1976)
L.H. Robins, P.C. Taylor and T.A. Kennedy, Phys. Rev. B 38, 13227 (1988)
M. Baeumler, J. Schneider, U. Kaufmann, W.C. Mitchel and P.W. Yu, Phys. Rev. B March 15 (1989)
B.K. Meyer, D.M. Hofmann, F. Lohse and J.M. Spaeth in: “Defects in Semiconductors” Eds. L.C. Kimerling, J.M. Parsey, J. Electronic Mat. 14b, 921 (1985)
D.Y. Jeon, H.P. Gislason, J.F. Donegan and G.D. Watkins, Phys. Rev. B 36, 1324 (1987)
B.K. Meyer, D.M. Hofmann, J.R. Niklas and J.M. Spaeth, Phys. Rev. B 36, 1332 (1987)
B.K. Meyer et al, this volume
H.J.v. Bardeleben, D. Stievenard, D. Deresmes, A. Huber and J.C. Bourgoin, Phys. Rev. B 34, 7192 (1986)
G.A. Baraff, M. Lannoo and M. Schlüter, Phys. Rev. B 38, 6083 (1988)
E.R. Weber and M. Kaminska in: “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) pp. 111
E.R. Weber “Semi-Insulating III–V Materials” Eds. D.C. Look and J.S. Blakemoore (Shiva Ltd. 1984), pp. 296
U. Kaufmann, J. Windscheif, M. Baeumler, J. Schneider and F. Köhl, see Ref. 78, “Semi-Insulating III–V Materials” Eds. D.C. Look and J.S. Blakemoore (Shiva Ltd. 1984), pp. 246
J.C. Bourgoin, H.J.v. Bardeleben, D. Stievenard, J. Appl. Phys. 64, R65 (1988)
M. Baeumler, U. Kaufmann and J. Windscheif, Appl. Phys. Lett. 46, 781 (1985)
U. Kaufmann, “GaAs and related Compounds 1987” Eds. A. Christou, H.S. Rupprecht, Inst. Phys. Conf. Ser. 91, 41 (1988)
M. Baeumler, P.M. Mooney and U. Kaufmann, Materials Science Forum Vols 38–41, 785 (1989)
This fact casts doubt on the simple three level compensation model for SI GaAs involving only shallow donors and acceptors and the AsGa/EL2 mid-gap level
E.R. Weber, H. Ennen, U. Kaufmann, J. Windscheif, J. Schneider and T. Wosinski, J. Appl. Phys. 53, 6140 (1982)
E.R. Weber and J. Schneider, Physica 116B, 398 (1983)
Recovery of EL20 occurs around 130 K but complete recovery of As +Ga is not achieved below 250 K. Since different charge states are monitored this does not necessarily mean that different defects are involved.
M. Baeumler, U. Kaufmann and J. Windscheif, Mat. Res. Soc. Proc. Vol. 46, 201 (1985)
N. Tsukada, T. Kikuta and K. Ishida, Phys. Rev. B 33, 8859 (1986)
J. Schneider, B. Dischler, H. Seelewind, P. Mooney, J. Lagowski, M. Matsui, D.R. Beard and R. Newman, Appl. Phys. Lett. April (1989)
H.Ch. Alt, Appl. Phys. Lett. April (1989)
Contrary to what one expects for a mid-gap donor, no As +Ga enhancement is visible below 1.0 eV in Fig. 8a. The reason is that for the sample in question the AsGa (o/+) level is partially compensated and therefore As +Ga quenching competes with As +Ga enhancement. If only As oGa is present in thermal equilibrium one also observes an As +Ga enhancement between 0.75 eV and 1.0 eV, see Ref. 93 Japanese J. Appl. Phys. 24, L689 (1985)
N. Tsukada, T. Kikuta and K. Ishida, Japanese J. Appl. Phys. 24, L689 (1985)
J. Lagowski, M. Matsui, M. Bugajski, C.H. Kang, M. Skowronski, H.C. Gatos, M. Hoinkis, E.R. Weber and W. Walukiewicz, “GaAs and Related Compounds 1987” Eds. A. Christou, H.S. Rupprecht, Inst. Phys. Conf. Ser. 91, 395 (1988)
B.K. Meyer, D.M. Hofmann and J.M. Spaeth, J. Phys. C 20, 2445 (1987)
B.K. Meyer, J.M. Spaeth and M. Scheffler, Phys. Rev. Lett. 52, 851 (1984)
A. Winnacker, Th. Vetter and F.X. Zach “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) pp. 583
U. Kaufmann, Phys. Rev. Lett. 54, 1332 (1985)
U. Kaufmann and J. Windscheif, Phys. Rev. B 38, 10060 (1988)
U. Kaufmann and J. Windscheif, “Semi-Insulating III–V Materials” Eds. G. Grossmann, L. Ledebo (Adam Hilger, 1988) pp. 343
J.S. Blakemore, J. Appl. Phys. 53, R123 (1982)
M. Baeumler, B.K. Meyer, U. Kaufmann and J. Schneider, “Defects in Semiconductors” Ed. G. Ferenczi (Trans Tech, 1989) Materials Science Forum Vols. 38–41, pp. 797
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Kaufmann, U. (1989). The spectroscopic evidence for the identity of EL2 and the AsGa antisite in As-grown GaAs. In: Rössler, U. (eds) Festkörperprobleme 29. Advances in Solid State Physics, vol 29. Springer, Berlin, Heidelberg. https://doi.org/10.1007/BFb0108012
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DOI: https://doi.org/10.1007/BFb0108012
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