Abstract
An introduction to semiconductor device microfabrication is presented outlining the motivations and limitations of further feature size reduction in planar technology. Various electron-beam exposure systems now under development are described and assessed in terms of resolution, field size, alignment accuracy, throughput, and flexibility. Included are scanning-beam mask generators, 1:1 electron projection systems, X-ray duplicators, and demagnifying electron imaging. Electron-sensitive polymer resists, microetching techniques, and automatic mask inspection are also briefly discussed.
Preview
Unable to display preview. Download preview PDF.
References
R. W. Keyes, Proc. IEEE 63, 740 (1975), see also: J. T. Wallmark, Inst. Phys. Conf. Ser. 25, 133 (1975).
F. H. Dill, J. A. Tuttle and A. R. Neureuther, Int. Electron Devices Meeting, Washington D.C. (1974).
H. I. Smith Proc. IEEE 62, 1361 (1974), see also E. I. Gordon and D. R. Herriott, IEEE Trans. ED. 22, 371 (1975).
F. M. D'Heuerle, Proc. IEEE 59, 1409 (1971).
J. Hersener und T. Ricker, Wiss. Berichte AEG-Telefunke 48, 46 (1975).
H. J. Harloff, Phys. Bl. 32, 119 (1976).
Thomson-CSF EPG 102, see also Rev. Technique Thomson-CSF 5 (1973).
J. P. Beasley and D. G. Squire, IEEE Trans. ED 22, 376 (1975).
D. R. Heriott, R. J. Collier, D. S. Alles and J. W. Stafford, Ref. [8] 22, 385 (1975).
A. J. Speth, A. D. Wilson, A. Kern and T. H. P. Chang, J. Vac. Sci. Technol. 12, 1235 (1975).
T. Ricker und J. Hersener, Vakuum-Technik 24 223 (1975).
T. W. O'Keefe, J. Vine and R. M. Handy, Solid-State Electron. 12, 841 (1969).
J. P. Scott, Ref. [8] 409 (1975).
S. E. Bernacki and H. J. Smith, Ref. [8], 421 (1975).
G. Möllenstedt and R. Speidel, Phys. Bl. 16, 192 (1960).
H. Koops and W. Bernhard, Ref. [10], 1141 (1975).
M. B. Heritage, Ref. [10], 1135 (1975).
D. R. Herriott, Ref. [10], 1121 (1975).
G. Owen and W. C. Nixon, J. Vac. Sci, Technol. 10, 983 (1973).
E. Munro, Ref. [10], 1146 (1975).
K. Amboss, Ref. [10], 1152 (1975).
M. G. R. Thompson, Ref. [10], 1156 (1975).
W. R. Livesay, Solid State Technol. 17, 37 (1974).
H. C. Pfeiffer, Ref. [10], 1170 (1975).
A. D. Wilson, T. H. P. Chang and A. Kern, Ref. [10], 1240 (1975).
D. S. Alles, F. R. Ashley, A. M. Johnson and R. L. Townsend Ref. [10], 1252 (1975).
A. N. Broers, Proc. IITRI Scanning Electron Microscopy, Chicago 1975, 661.
F. S. Ozdemir, C. R. Buckey and E. D. Wolf, Ref. [10], 1246 (1975).
H. G. Parks and W. C. Hughes, [10], 1161 (1975).
L. N. Heynik, E. R. Westerberg, C. C. Hartelius and R. E. Lee, Ref. [8], 399 (1975).
L. F. Thompson, Solid State Technol., 17, 27 and 41 (1974).
T. Hirai, Y. Hatano and S. Nonogaki, J. Electrochem. Soc. 118, 669 (1971).
H. S. Cole, D. W. Skelly and B. C. Wagner, Ref. [8], 417 (1975).
L. F. Thompson, E. D. Feit and R. D. Heidenreich, Reg. Techn. Conference of the Society of Plastic Engineers, Ellenville, N. Y. October 24–26, 1973, p 127.
G. Paal, U. D. Strähle and G. Kielhorn, J. Electrochem. Soc. 120, 1714 (1973).
J. S. Greeneich and T. van Duzer, J. Vac. Sci. Technol. 10, 1056 (1973).
D. F. Kyser and K. Murata, Proc. 6. Int. Conf. on Electron and Ion Beam Sci. and Technol., San Francisco 1974, 479.
T. H. P. Chang, Ref. [10], 1271 (1975).
G. A. Wardly, Ref. [8], 414 (1975).
G. Maydan, G. A. Coquin, J. R. Maldonado, S. Somekh, D. Y. Lou and G. N. Taylor, Ref. [8], 429 (1975).
B. J. Lin, Ref. [10], 1317 (1975).
R. F. W. Pease, J. P. Ballantyne, R. C. Henderson, A. M. Voshchenkov and L. D. Yau, Ref. [8], 393 (1975).
H. F. Mataré, Defect Electronics in Semiconductors, Wiley-Interscience, New York 1971, see also: J. W. Corbett and J. C. Bourgoin, in: Point Defects in Solids 2, Ed. J. H. Crawford and L. M. Slifkin, Plenum Press, New York 1975.
C. B. Norris, J. Appl. Phys. 43, 4060 (1972), see also: H. Föll, Inst. Phys. Conf. Ser. 23, 233 (1975).
LFE Corp., Application Note 8213—TA, Waltham, Mass. (1975).
E. G. Spencer and P. H. Schmidt, J. Vac. Sci. Technol. 8, S. 52 (1971).
M. Cantagrel, Ref. [8], 483 (1975).
M. Cantagrel, Ref. [10], 1340 (1975).
M. Hatzakis, J. Electrochem. Soc. 116, 1033 (1969).
L. S. Watkins, Appl. opt. 12, 1880 (1973).
J. H. Bruning, M. Feldman, T. S. Kinsel, E. K. Sittig and R. L. Townsend, Ref. [8],, 487 (1975).
R. O. Duda and P. E. Hart, Pattern Classification and Scene Analysis, Wiley-Interscience, New York 1973.
Author information
Authors and Affiliations
Editor information
Rights and permissions
Copyright information
© 1976 Friedr. Vieweg & Sohn Verlagsgesellschaft mbH
About this chapter
Cite this chapter
Ricker, T. (1976). Electron-beam lithography—A viable solution?. In: Treusch, J. (eds) Festkörperprobleme 16. Advances in Solid State Physics, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/BFb0107745
Download citation
DOI: https://doi.org/10.1007/BFb0107745
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-528-08022-8
Online ISBN: 978-3-540-75354-4
eBook Packages: Springer Book Archive