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Festkörperprobleme 16 pp 217–237Cite as

Electron-beam lithography—A viable solution?

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Part of the book series: Advances in Solid State Physics ((ASSP,volume 16))

Abstract

An introduction to semiconductor device microfabrication is presented outlining the motivations and limitations of further feature size reduction in planar technology. Various electron-beam exposure systems now under development are described and assessed in terms of resolution, field size, alignment accuracy, throughput, and flexibility. Included are scanning-beam mask generators, 1:1 electron projection systems, X-ray duplicators, and demagnifying electron imaging. Electron-sensitive polymer resists, microetching techniques, and automatic mask inspection are also briefly discussed.

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References

  1. R. W. Keyes, Proc. IEEE 63, 740 (1975), see also: J. T. Wallmark, Inst. Phys. Conf. Ser. 25, 133 (1975).

    Article  ADS  Google Scholar 

  2. F. H. Dill, J. A. Tuttle and A. R. Neureuther, Int. Electron Devices Meeting, Washington D.C. (1974).

    Google Scholar 

  3. H. I. Smith Proc. IEEE 62, 1361 (1974), see also E. I. Gordon and D. R. Herriott, IEEE Trans. ED. 22, 371 (1975).

    Article  ADS  Google Scholar 

  4. F. M. D'Heuerle, Proc. IEEE 59, 1409 (1971).

    Article  Google Scholar 

  5. J. Hersener und T. Ricker, Wiss. Berichte AEG-Telefunke 48, 46 (1975).

    Google Scholar 

  6. H. J. Harloff, Phys. Bl. 32, 119 (1976).

    Google Scholar 

  7. Thomson-CSF EPG 102, see also Rev. Technique Thomson-CSF 5 (1973).

    Google Scholar 

  8. J. P. Beasley and D. G. Squire, IEEE Trans. ED 22, 376 (1975).

    Article  Google Scholar 

  9. D. R. Heriott, R. J. Collier, D. S. Alles and J. W. Stafford, Ref. [8] 22, 385 (1975).

    Article  Google Scholar 

  10. A. J. Speth, A. D. Wilson, A. Kern and T. H. P. Chang, J. Vac. Sci. Technol. 12, 1235 (1975).

    Article  ADS  Google Scholar 

  11. T. Ricker und J. Hersener, Vakuum-Technik 24 223 (1975).

    Google Scholar 

  12. T. W. O'Keefe, J. Vine and R. M. Handy, Solid-State Electron. 12, 841 (1969).

    Article  ADS  Google Scholar 

  13. J. P. Scott, Ref. [8] 409 (1975).

    Article  Google Scholar 

  14. S. E. Bernacki and H. J. Smith, Ref. [8], 421 (1975).

    Article  Google Scholar 

  15. G. Möllenstedt and R. Speidel, Phys. Bl. 16, 192 (1960).

    Google Scholar 

  16. H. Koops and W. Bernhard, Ref. [10], 1141 (1975).

    Article  ADS  Google Scholar 

  17. M. B. Heritage, Ref. [10], 1135 (1975).

    Article  ADS  Google Scholar 

  18. D. R. Herriott, Ref. [10], 1121 (1975).

    Article  ADS  Google Scholar 

  19. G. Owen and W. C. Nixon, J. Vac. Sci, Technol. 10, 983 (1973).

    Article  ADS  Google Scholar 

  20. E. Munro, Ref. [10], 1146 (1975).

    Article  ADS  Google Scholar 

  21. K. Amboss, Ref. [10], 1152 (1975).

    Article  ADS  Google Scholar 

  22. M. G. R. Thompson, Ref. [10], 1156 (1975).

    Article  ADS  Google Scholar 

  23. W. R. Livesay, Solid State Technol. 17, 37 (1974).

    Google Scholar 

  24. H. C. Pfeiffer, Ref. [10], 1170 (1975).

    Article  ADS  Google Scholar 

  25. A. D. Wilson, T. H. P. Chang and A. Kern, Ref. [10], 1240 (1975).

    Article  ADS  Google Scholar 

  26. D. S. Alles, F. R. Ashley, A. M. Johnson and R. L. Townsend Ref. [10], 1252 (1975).

    Article  ADS  Google Scholar 

  27. A. N. Broers, Proc. IITRI Scanning Electron Microscopy, Chicago 1975, 661.

    Google Scholar 

  28. F. S. Ozdemir, C. R. Buckey and E. D. Wolf, Ref. [10], 1246 (1975).

    Article  ADS  Google Scholar 

  29. H. G. Parks and W. C. Hughes, [10], 1161 (1975).

    Article  ADS  Google Scholar 

  30. L. N. Heynik, E. R. Westerberg, C. C. Hartelius and R. E. Lee, Ref. [8], 399 (1975).

    Article  Google Scholar 

  31. L. F. Thompson, Solid State Technol., 17, 27 and 41 (1974).

    Google Scholar 

  32. T. Hirai, Y. Hatano and S. Nonogaki, J. Electrochem. Soc. 118, 669 (1971).

    Article  Google Scholar 

  33. H. S. Cole, D. W. Skelly and B. C. Wagner, Ref. [8], 417 (1975).

    Article  Google Scholar 

  34. L. F. Thompson, E. D. Feit and R. D. Heidenreich, Reg. Techn. Conference of the Society of Plastic Engineers, Ellenville, N. Y. October 24–26, 1973, p 127.

    Google Scholar 

  35. G. Paal, U. D. Strähle and G. Kielhorn, J. Electrochem. Soc. 120, 1714 (1973).

    Article  Google Scholar 

  36. J. S. Greeneich and T. van Duzer, J. Vac. Sci. Technol. 10, 1056 (1973).

    Article  ADS  Google Scholar 

  37. D. F. Kyser and K. Murata, Proc. 6. Int. Conf. on Electron and Ion Beam Sci. and Technol., San Francisco 1974, 479.

    Google Scholar 

  38. T. H. P. Chang, Ref. [10], 1271 (1975).

    Article  ADS  Google Scholar 

  39. G. A. Wardly, Ref. [8], 414 (1975).

    Article  Google Scholar 

  40. G. Maydan, G. A. Coquin, J. R. Maldonado, S. Somekh, D. Y. Lou and G. N. Taylor, Ref. [8], 429 (1975).

    Article  Google Scholar 

  41. B. J. Lin, Ref. [10], 1317 (1975).

    Article  ADS  Google Scholar 

  42. R. F. W. Pease, J. P. Ballantyne, R. C. Henderson, A. M. Voshchenkov and L. D. Yau, Ref. [8], 393 (1975).

    Article  Google Scholar 

  43. H. F. Mataré, Defect Electronics in Semiconductors, Wiley-Interscience, New York 1971, see also: J. W. Corbett and J. C. Bourgoin, in: Point Defects in Solids 2, Ed. J. H. Crawford and L. M. Slifkin, Plenum Press, New York 1975.

    Google Scholar 

  44. C. B. Norris, J. Appl. Phys. 43, 4060 (1972), see also: H. Föll, Inst. Phys. Conf. Ser. 23, 233 (1975).

    Article  ADS  Google Scholar 

  45. LFE Corp., Application Note 8213—TA, Waltham, Mass. (1975).

    Google Scholar 

  46. E. G. Spencer and P. H. Schmidt, J. Vac. Sci. Technol. 8, S. 52 (1971).

    Article  ADS  Google Scholar 

  47. M. Cantagrel, Ref. [8], 483 (1975).

    Article  Google Scholar 

  48. M. Cantagrel, Ref. [10], 1340 (1975).

    Article  ADS  Google Scholar 

  49. M. Hatzakis, J. Electrochem. Soc. 116, 1033 (1969).

    Article  Google Scholar 

  50. L. S. Watkins, Appl. opt. 12, 1880 (1973).

    Article  ADS  Google Scholar 

  51. J. H. Bruning, M. Feldman, T. S. Kinsel, E. K. Sittig and R. L. Townsend, Ref. [8],, 487 (1975).

    Article  Google Scholar 

  52. R. O. Duda and P. E. Hart, Pattern Classification and Scene Analysis, Wiley-Interscience, New York 1973.

    MATH  Google Scholar 

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Authors and Affiliations

  1. Forschungsinstitut Ulm, AEG-Telefunken, Ulm, Germany

    Thomas Ricker

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  1. Thomas Ricker
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J. Treusch

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© 1976 Friedr. Vieweg & Sohn Verlagsgesellschaft mbH

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Ricker, T. (1976). Electron-beam lithography—A viable solution?. In: Treusch, J. (eds) Festkörperprobleme 16. Advances in Solid State Physics, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/BFb0107745

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  • DOI: https://doi.org/10.1007/BFb0107745

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-528-08022-8

  • Online ISBN: 978-3-540-75354-4

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