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Electron-beam lithography—A viable solution?

  • Thomas Ricker
Chapter
Part of the Advances in Solid State Physics book series (ASSP, volume 16)

Abstract

An introduction to semiconductor device microfabrication is presented outlining the motivations and limitations of further feature size reduction in planar technology. Various electron-beam exposure systems now under development are described and assessed in terms of resolution, field size, alignment accuracy, throughput, and flexibility. Included are scanning-beam mask generators, 1:1 electron projection systems, X-ray duplicators, and demagnifying electron imaging. Electron-sensitive polymer resists, microetching techniques, and automatic mask inspection are also briefly discussed.

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Copyright information

© Friedr. Vieweg & Sohn Verlagsgesellschaft mbH 1976

Authors and Affiliations

  • Thomas Ricker
    • 1
  1. 1.Forschungsinstitut UlmAEG-TelefunkenUlmGermany

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