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MPI-based parallel implementation of a lithography pattern simulation algorithm

  • Track C1: (Industrial) End-user Applications of HPCN
  • Conference paper
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High-Performance Computing and Networking (HPCN-Europe 1999)

Part of the book series: Lecture Notes in Computer Science ((LNCS,volume 1593))

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Abstract

This paper presents the parallelization of a pattern simulation algorithm for Imaging Interferometric Lithography (IIL), a Very Large Scale Integration (VLSI) process technology for producing sub-micron features. The approach uses Message Passing Interface (MPI) libraries [1]. We also discuss some modifications to the basic parallel implementation that will result in efficient memory utilization and reduced communications among the processors. The scalability of runtime with degree of parallelism is also demonstrated. The scalability of runtime with degree of parallelism is also demonstrated. The algorithm was tested on three different platforms: IBM SP-2 running AIX, SGI Onyx 2 running IRIX 6.4, and a LINUX cluster of Pentium-233 workstations. The paper presents the results of these tests and also provides a comparison with those obtained with Mathcad (on Windows 95) and serial C (on Unix) implementations.

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References

  1. P. S. Pacheco, “Parallel Programming with MPI”, Morgan-Kaufmann Publishers, 1997.

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  2. S. H. Zaidi, S. R. J. Brueck, “Multiple Exposure Interferometric Lithography,” J. Vac. Sc., Tech, B 11, 658–666, 1993.

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Author information

Authors and Affiliations

  1. Albuquerque High Performance Computing Center (AHPCC), University of New Mexico (UNM), 87131, Albuquerque, NM

    H. Radhakrishna & A. Waters

  2. EECE Dept., UNM, 87131, Albuquerque, NM

    S. Divakar & N. Magotra

  3. Center for High Technology Materials, UNM, 87131, Albuquerque, NM

    S. R. J. Brueck

Authors
  1. H. Radhakrishna
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  2. S. Divakar
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  3. N. Magotra
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  4. S. R. J. Brueck
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  5. A. Waters
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Editor information

Peter Sloot Marian Bubak Alfons Hoekstra Bob Hertzberger

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© 1999 Springer-Verlag

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Radhakrishna, H., Divakar, S., Magotra, N., Brueck, S.R.J., Waters, A. (1999). MPI-based parallel implementation of a lithography pattern simulation algorithm. In: Sloot, P., Bubak, M., Hoekstra, A., Hertzberger, B. (eds) High-Performance Computing and Networking. HPCN-Europe 1999. Lecture Notes in Computer Science, vol 1593. Springer, Berlin, Heidelberg . https://doi.org/10.1007/BFb0100571

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  • DOI: https://doi.org/10.1007/BFb0100571

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-65821-4

  • Online ISBN: 978-3-540-48933-7

  • eBook Packages: Springer Book Archive

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