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MPI-based parallel implementation of a lithography pattern simulation algorithm

  • H. Radhakrishna
  • S. Divakar
  • N. Magotra
  • S. R. J. Brueck
  • A. Waters
Track C1: (Industrial) End-user Applications of HPCN
Part of the Lecture Notes in Computer Science book series (LNCS, volume 1593)

Abstract

This paper presents the parallelization of a pattern simulation algorithm for Imaging Interferometric Lithography (IIL), a Very Large Scale Integration (VLSI) process technology for producing sub-micron features. The approach uses Message Passing Interface (MPI) libraries [1]. We also discuss some modifications to the basic parallel implementation that will result in efficient memory utilization and reduced communications among the processors. The scalability of runtime with degree of parallelism is also demonstrated. The scalability of runtime with degree of parallelism is also demonstrated. The algorithm was tested on three different platforms: IBM SP-2 running AIX, SGI Onyx 2 running IRIX 6.4, and a LINUX cluster of Pentium-233 workstations. The paper presents the results of these tests and also provides a comparison with those obtained with Mathcad (on Windows 95) and serial C (on Unix) implementations.

Keywords

Message Passing Interface Modulation Transfer Function Very Large Scale Integration Mask Pattern Optical Lithography 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. [1]
    P. S. Pacheco, “Parallel Programming with MPI”, Morgan-Kaufmann Publishers, 1997.Google Scholar
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    S. H. Zaidi, S. R. J. Brueck, “Multiple Exposure Interferometric Lithography,” J. Vac. Sc., Tech, B 11, 658–666, 1993.CrossRefGoogle Scholar
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    X. Chen, Z. Zhang, S. R. J. Brueck, R. A. Carpio, J. S. Peterson, “Process Development for 180 nm Structures using Interferometric Lithography and I-Line Photoresist,” Proc. SPIE 3048, 309, 1997.Google Scholar
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    X. Chen, S. R. J. Brueck, “Imaging Interferometric Lithography—A Wavelength Division Multiplex Approach to Extending Optical Lithography,” J. Vac. Sc. Technol., to be published Nov./Dec. 1998.Google Scholar
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    N. Magotra, S. Divakar, C. Tu, S. R. J. Brueck, X. Chen, “Digital Image Processing Applied to Imaging Interferometric Lithography”, IEEE Asilomar Conference on Signals and Systems, Monterey Calif., 1998.Google Scholar
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    X. Chen, “A study of Interferometric lithography—Approaching the linear systems of optics,” Ph.D. dissertation, EECE department, UNM, Aug 1998.Google Scholar

Copyright information

© Springer-Verlag 1999

Authors and Affiliations

  • H. Radhakrishna
    • 1
  • S. Divakar
    • 2
  • N. Magotra
    • 2
  • S. R. J. Brueck
    • 3
  • A. Waters
    • 1
  1. 1.Albuquerque High Performance Computing Center (AHPCC)University of New Mexico (UNM)Albuquerque
  2. 2.EECE Dept.UNMAlbuquerque
  3. 3.Center for High Technology MaterialsUNMAlbuquerque

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