Technology and fabrication of quantum devices: Submicron lithography and etching techniques

  • Sybrand Radelaar
Conference paper
Part of the Lecture Notes in Physics book series (LNP, volume 419)


Proximity Effect Electron Beam Lithography Pattern Transfer Optical Lithography Selective Deposition 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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  1. G.R.Brewer, Editor Electron Beam Technology in Microfabrication Academic Press, New York (1980)Google Scholar
  2. Chang et al IBM J.Res.Develop. 32,462 (1988)Google Scholar
  3. F.C.Chen Introduction to Plasma Physics Plenum, New York (1977)Google Scholar
  4. P.A.M.Holweg, J.Caro, A.H.Verbruggen and S.Radelaar Fabrication of metallic nanoconstrictions Microelectronic Engineering 11 (1990) 27–30Google Scholar
  5. C.A.van der Jeugd, G.J.Leusink, G.CAM. Janssen and S.Radelaar Appl. Phys. Letters 57 (1990) 354–356CrossRefGoogle Scholar
  6. D.P.Kern in Quantum Effects Physics, Electronics and Applications, K.Ismail,T.Ikoma and H.I.Smith editors Institute of Physics Conference Series Number 127, p. 73–78Google Scholar
  7. A. Manenschijn, W.J.Goedheer Angular angular ion and neutral distribution in a collisional rf sheath J.Appl.Phys. 69 (1990) 2923–2930Google Scholar
  8. C.R.K.Marrian and E.A.Dobisz High-resolution lithography with a vacuum STM Ultramicroscopy 42-44, p.1309–1316 (1992)Google Scholar
  9. E.A.Dobisz and C.R.K.Marrian Scanning tunneling microscope lithography: A solution to electron scattering J.Vac.Sci. Technol. B 9 (1991) 3024–3027Google Scholar
  10. P.M. Petroff et al. in Quantum Effects Physics, Electronics and Applications K.Ismail,T.Ikoma and H.I.Smith editors Institute of Physics Conference Series Number 127 (1992),p 85–94Google Scholar
  11. J. Romijn and E. van der Drift Nanometer-scale lithography for large lateral structures Physica B 152 (1988) 14–21CrossRefGoogle Scholar
  12. AJ.van Roosmalen, J.A.G.Baggerman and S.J.H.Brader Dry Etching for VLSI Plenum Press, New York and London (1991)Google Scholar
  13. A.H.Verbruggen, P.A.M.Holweg, H.Vloeberghs, C.van Haesendonck, J.Romijn, S.Radelaar and Y. Bruynseraede. Microelectronic Engineering 13, 407 (1991)CrossRefGoogle Scholar
  14. A.C.Warren, D.A.Antoniadis, H.I.Smith and J.Melngailis IEEE Electron Device Letters EDL 6 (1985) 294Google Scholar

Copyright information

© Springer-Verlag 1993

Authors and Affiliations

  • Sybrand Radelaar
    • 1
  1. 1.DIMES, (Delft Institute for Micro-Electronics and Submicrontechnology)DelftThe Netherlands

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