Abstract
MOSFET is replaced by the best adaptable nanodevice, Carbon Nanotubes Field-Effect Transistor (CNTFET) for low-power, small area and delay-optimized VLSI circuit design [1, 2]. In this paper, a dual supply-stacked CNTFET SRAM cell is designed. The performance of 6T CNTFET SRAM cell, stack CNTFET SRAM cell and dual supply-stacked CNTFET SRAM cell is observed by calculating performance metrics of the memory cell such as static power and Static Noise Margin (SNM). From the simulation, it is observed that dual supply stack CNTFET SRAM cell static power is 15.8% lesser, SNM is 1.8% higher than stacked CNTFET SRAM. SNM improvement of 9.62% and static power reduction of 46.92% is obtained in dual supply-stacked CNTFET SRAM cell than 6T CNTFET SRAM cell. Simulation is carried out using Stanford University 32 nm CNTFET model invoked in CADENCE EDA tool.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
Deng J (2007) Device modeling and circuit performance evaluation for nanoscale devices: silicon technology beyond 45 nm node and carbon nanotube field effect transistors. Ph.D. thesis, Stanford University
Dai H (2002) Carbon nanotubes: synthesis, integration, and properties. Acc Chem Res 35(12)
Zhang Z, Delgado-Frias JG (2014) Near-threshold CNTFET SRAM cell design with-line boosting and removed metallic CNT tolerance. IEEE Trans Nano Tech 13(2) (March 2014)
Rajendra Prasad S, Madhavi BK, Lal Kishore K (2012) Design of 32 nm forced stack CNTFET SRAM cell for leakage power reduction. In: International conference on computing, electronics and electrical technologies [ICCEET]
Birla S, Shukla NK, Pattanaik M, Singh RK (2010) Device and circuit design challenges for low leakage SRAM for ultra low power applications. Can J Electr Electron Eng 1(7):157–167
Zhang Z, Delgado-Frias JG (2011) Low power and metallic CNT tolerant CNTFET SRAM design. In: 11th IEEE international conference on nanotechnology. Portland Marriott, 15–18 August 2011
Mukherjee D, Mondal HK, Reddy BVR (2010) Static noise margin analysis of SRAM cell for high speed application. IJCSI Int J Comput Sci 7(5) (Sept 2010)
Birla S, Pattanaik M, Singh RK (2011) Static noise margin analysis of various SRAM topologies. IACSIT Int J Eng Technol 3(3):304–309
Sivamangai NM, Gunavathi K (2011) A low power SRAM cell with high read stability. ECTI Trans on Electr Eng Electron Commun 9(1) (Feb 2011)
Rahman N, Singh BP (2013) Static-noise-margin analysis of conventional 6T SRAM CELL at 45 nm technology. Int J Comput Appl 66(20):0975–8887 (March 2013)
Tiwari M, Sharma KK, Rawat LS, Kohli VC (2015) Impact of oxide thickness on gate capacitance, drain current and transconductance—a comprehensive analysis on MOSFET, nano wire FET and CNTFET devices. Int J Res Emerg Sci Technol 2(6) (June 2015)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2019 Springer Nature Singapore Pte Ltd.
About this paper
Cite this paper
Elangovan, M., Gunavathi, K. (2019). High Stability and Low-Power Dual Supply-Stacked CNTFET SRAM Cell. In: Saini, H., Singh, R., Patel, V., Santhi, K., Ranganayakulu, S. (eds) Innovations in Electronics and Communication Engineering. Lecture Notes in Networks and Systems, vol 33. Springer, Singapore. https://doi.org/10.1007/978-981-10-8204-7_21
Download citation
DOI: https://doi.org/10.1007/978-981-10-8204-7_21
Published:
Publisher Name: Springer, Singapore
Print ISBN: 978-981-10-8203-0
Online ISBN: 978-981-10-8204-7
eBook Packages: EngineeringEngineering (R0)