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Application of Suresh and Lee Models in the Measurement of Residual Stress of Films

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Abstract

The thin film materials with small volume and high reliability have become an integral part of microelectromechanical systems and have a wide range of applications in national defense, aerospace, communication, automobile manufacturing, and other fields. The service reliability and service life are determined by the mechanical properties of thin film materials.

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References

  1. Liu JN. Study on mechanical property of films by nanoscale dynamic load test technology (in Chinese). Doctor dissertation. Haerbin: Haerbin Engineering University; 2016.

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  2. Liu JN, Xu BS, Wang HD, et al. Measurement for mechanical behavior and fatigue property of Cu films by nanoscale dynamic load method. Mater Des. 2015;65:1136–42.

    Article  Google Scholar 

  3. Liu JN, Xu BS, Wang HD, et al. Effects of film thickness and microstructures on residual stress. Surf Eng. 2016;32:178–84.

    Article  Google Scholar 

  4. Wang HD, Dong ML, Cui XF, et al. Mechanical properties of nano Ti films with different thickness (in Chinese). J Mater Eng. 2015;43(11):50–6.

    Google Scholar 

  5. Dong ML, Wang HD, Jin G, et al. The effect of different substrate temperatures on the microstructure and residual stress of Ti film. Rare Metal Mater Eng. 2016;45(4):843–8.

    Article  Google Scholar 

  6. Dong ML. Study on residual stress of thin films by nanoindentation technology (in Chinese). Master dissertation. Haerbin: Haerbin Engineering University; 2015.

    Google Scholar 

  7. Dong ML, Cui XF, Jin G, et al. The mechanical and corrosion resistance properties of Ti/TiN multi-layer films produced by physical vapor deposition. Anti-Corros Methods Mater. 2015;62(3):149–55.

    Article  Google Scholar 

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Correspondence to Haidou Wang .

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© 2018 Springer Nature Singapore Pte Ltd. and Science Press

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Wang, H., Zhu, L., Xu, B. (2018). Application of Suresh and Lee Models in the Measurement of Residual Stress of Films. In: Residual Stresses and Nanoindentation Testing of Films and Coatings. Springer, Singapore. https://doi.org/10.1007/978-981-10-7841-5_6

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