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Geometry Scaling Impact on Leakage Currents in FinFET Standard Cells Based on a Logic-Level Leakage Estimation Technique

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Microelectronics, Electromagnetics and Telecommunications

Part of the book series: Lecture Notes in Electrical Engineering ((LNEE,volume 471))

Abstract

Static power consumption is one of the most critical issues in CMOS digital circuits, and FinFET technology is being recognized as a valid solution for the problem. In this chapter, we utilize a logic-level leakage current estimation technique relying on an internal node voltage-based model. The model is implemented in the form of VHDL packages. By utilizing the capability of the model, the behavior of major leakage component has been analyzed separately for FinFET technology scaling over single- and multi-stage digital standard cells.

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References

  1. International Technology Roadmap for Semiconductors. International SEMATECH, Austin, TX. http://public.itrs.net.

  2. R. Chau et al. “Application of High-k Gate Dielectric and Metal Gate Electrodes to enable Silicon and Non-Silicon Logic Nanotechnology”, Microelectron Engineering, Vol. 80, pp. 1–6, June 2005.

    Google Scholar 

  3. Z. Abbas, V. Genua, and M. Olivieri, “A novel logic level calculation model for leakage currents in digital nano-CMOS circuits,” in Proc. IEEE 7th Conf. PRIME, Jul. 2011, pp. 221–224.

    Google Scholar 

  4. Zia Abbas, Mauro Olivieri, Andreas Ripp “Yield-Driven Power-Delay-Optimal CMOS Full Adder Design complying with Automotive Product Specifications of PVT Variations and NBTI Degradations” Journal of Computational Electronics (Springer), Vol. 15, Issue. 4, pp. 1424–1439, 2016.

    Google Scholar 

  5. Zia Abbas, Mauro Olivieri, “Impact of Technology Scaling on Leakage Power in nano-scale bulk CMOS Digital Standard Cell Library” Elsevier Microelectronics Journal, Vol. 45, Issue. 2, pp. 179–195, Feb. 2014.

    Google Scholar 

  6. T.-J. King, “FinFETs for nanoscale CMOS digital integrated circuits,” in Proc. Int. Conf. Computer-Aided Design, Nov. 2005, pp. 207–210.

    Google Scholar 

  7. M. Olivieri, G. Scotti and A. Trifiletti, “A Novel Yield Optimization Technique for Digital CMOS Circuits Design by Means of Process Parameters Run-Time Estimation and Body Bias Active Control”, IEEE transactions on Very Large Scale Integration (VLSI) Systems, Vol. 13, No. 5, May 2005.

    Google Scholar 

  8. S. Mukhopadhyay, S. Bhunia, K. Roy, “Modeling and Analysis of Loading Effect in Leakage of Nano-Scaled Bulk- CMOS Logic Circuits,” IEEE Trans. on Computer Aided Design of Electronic Circuits and Systems, vol. 25, n. 8, Aug. 2006.

    Google Scholar 

  9. Z. Abbas, A. Mastrandrea and M. Olivieri, “A Voltage-Based Leakage Current Calculation Scheme and its Application to Nanoscale MOSFET and FinFET Standard-Cell Designs”, IEEE transactions on Very Large Scale Integration (VLSI) Systems, Vol. 22, No. 12, Dec 2014.

    Google Scholar 

  10. Venugopalan, S, Karim, M. A., Lu, D. D., Niknejad, A. M., Hu C., “Compact models for real device effects in FinFETs,” Proc. of International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Denver, CO, 2012.

    Google Scholar 

  11. Predictive Technology Model, http://ptm.asu.edu/.

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Correspondence to Zia Abbas .

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Abbas, Z., Zahra, A., Olivieri, M., Mastrandrea, A. (2018). Geometry Scaling Impact on Leakage Currents in FinFET Standard Cells Based on a Logic-Level Leakage Estimation Technique. In: Anguera, J., Satapathy, S., Bhateja, V., Sunitha, K. (eds) Microelectronics, Electromagnetics and Telecommunications. Lecture Notes in Electrical Engineering, vol 471. Springer, Singapore. https://doi.org/10.1007/978-981-10-7329-8_29

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  • DOI: https://doi.org/10.1007/978-981-10-7329-8_29

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  • Publisher Name: Springer, Singapore

  • Print ISBN: 978-981-10-7328-1

  • Online ISBN: 978-981-10-7329-8

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