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Linear Active Disturbance Rejection Control for Nanopositioning System by ITAE Optimal Tuning Approach

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Proceedings of 2017 Chinese Intelligent Systems Conference (CISC 2017)

Part of the book series: Lecture Notes in Electrical Engineering ((LNEE,volume 460))

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Abstract

Nano-positioning systems with piezoelectric actuators are widely used. However, hysteresis, a common phenomenon in piezoelectric material, makes the control of nano-positioning system be a challenge. A simple and effective approach to deal with hysteresis is necessary. In this paper, both hysteresis and other disturbances are regarded as total disturbance, and linear active disturbance rejection control (LADRC) is utilized. With the help of extended state observer (ESO), total disturbance can be estimated and it can be compensated by control signal in real time. Integral of time-multiplied absolute-value of error (ITAE) optimal bandwidth parameterization approach is utilized to determine the parameters of LADRC. Numerical results are presented to confirm LADRC and its tuning approach.

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Acknowledgements

This work is supported by National Natural Science Foundation of China (61403006).

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Authors and Affiliations

  1. School of Computer & Information Engineering, Beijing Technology and Business University, Beijing, China

    Wei Wei, XuDong Shen, YanJie Shao & Min Zuo

Authors
  1. Wei Wei
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  2. XuDong Shen
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  3. YanJie Shao
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  4. Min Zuo
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Corresponding author

Correspondence to Min Zuo .

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Editors and Affiliations

  1. Beihang University , Beijing, China

    Yingmin Jia

  2. Beijing University of Posts and Telecommunications, Beijing, China

    Junping Du

  3. University of Science and Technology Beijing, Beijing, China

    Weicun Zhang

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Wei, W., Shen, X., Shao, Y., Zuo, M. (2018). Linear Active Disturbance Rejection Control for Nanopositioning System by ITAE Optimal Tuning Approach. In: Jia, Y., Du, J., Zhang, W. (eds) Proceedings of 2017 Chinese Intelligent Systems Conference. CISC 2017. Lecture Notes in Electrical Engineering, vol 460. Springer, Singapore. https://doi.org/10.1007/978-981-10-6499-9_31

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  • DOI: https://doi.org/10.1007/978-981-10-6499-9_31

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  • Publisher Name: Springer, Singapore

  • Print ISBN: 978-981-10-6498-2

  • Online ISBN: 978-981-10-6499-9

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