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Physical Basis of Plasma Surface Metallurgy

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Abstract

The plasma surface metallurgy is a new discipline field in materials science and engineering. The newly developed surface metallurgy technology, Double Glow Plasma Surface Metallurgy Technology, or the Xu-Tec process, applies a series of physical processes, such as vacuum, gas discharge, low-temperature plasma, ion sputtering, surface adsorption, and atomic diffusion, to realize a surface alloying layer into the surface of the substrate matrix. This chapter introduces some basic knowledge and physics about the double glow discharge and the processing characteristics as well. Some preliminary discussion is presented on the related physical fundamental issues that involved in the Xu-Tec process.

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References

  1. Bechstedt F (2007) Surface physics. Science Press

    Google Scholar 

  2. Kittel (2005) Introduction to solid state physics, 8th edn. Chemical Industry Press

    Google Scholar 

  3. Li D (2006) Plasma physics. Higher Education Press

    Google Scholar 

  4. Xu Z (2008) Plasma surface metallurgy. China Science Press, Beijing, pp 79–98

    Google Scholar 

  5. Coburn JW, Chen L (1992) Surface treatment by partially ionized plasma. Adv Mech 4:527–541

    Google Scholar 

  6. Wasa K, Kitabatake M, Adachi H (2003) Thin film materials technology. William Andrew, Inc. and Springer-Verlag GmbH & Co. KG

    Google Scholar 

  7. He Z, Gao Y, Gu F, Xu Z (1995) Ion bombardment of double glow alloying surface process. Vacuum 1:29–35

    Google Scholar 

  8. Zhang G (2004), Research hydrogen-free carburizing and hydrogen–free carbonitriding on titanium alloy Ti6Al4 V by double glow plasma discharge Taiyuan University of Technology, Taiyuan

    Google Scholar 

  9. Xu Z (1997) The present situation and development of double glow plasma alloying process. Surf Technol 3:13–51

    Google Scholar 

  10. Li C, Xu Z (1987) Diffusion mechanism of ion bombardment. Surf Eng 4:310–313

    Article  Google Scholar 

  11. Zhang Pingze (2004) Double glow plasma surface alloyed burn-resistant titanium alloy. Taiyuan University of Science and Technology, Taiyuan

    Google Scholar 

  12. Li Z, Liu X, Xu Z (2000) Effect of concentration gradient of vacancies on diffusion in double glow plasma surface alloying. J Appl Sci 6:183–185

    Google Scholar 

  13. Li C, He Z, Xu Z (2000) Diffusion mechanism of ion bombardment W-Mo surface alloying. Trans Nonferrous Met Soc China 2:185–188

    Google Scholar 

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Correspondence to Zhong Xu .

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© 2017 Science Press, Beijing and Springer Nature Singapore Pte Ltd.

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Xu, Z., Xiong, F.F. (2017). Physical Basis of Plasma Surface Metallurgy. In: Plasma Surface Metallurgy. Springer, Singapore. https://doi.org/10.1007/978-981-10-5724-3_5

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