Abstract
Recently, LEDs based on heteroepitaxial GaN on Si substrates (GaN/Si) are attracting a great attention and are industrially developed by many companies in order to compete with LEDs based on GaN/sappire and GaN/SiC which are commercially marketed advancing GaN/Si LEDs, though GaN/Si LEDs have been realized early in 2002. The recent attention on GaN/Si is due the availability of low cost and large wafer size availability (up to 300 mm diameter) of Si substrates. In this article, we review the development of the GaN epitaxial growth on Si and summarize the development made in our laboratory including the device structures achieving the GaN/Si LEDs with higher emission efficiency. We describe on GaN/Si using (i) high-temperature (HT) AlN/AlGaN intermediate layers, (ii) HT intermediate layers (ILs) and multilayers (MLs), and (iii) strained-layer superlattices (SLS) interlayers and their LED performances, respectively. We believe that GaN/Si LEDs with low prices will become important LEDs for general lighting in the near future.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
I. Akasaki et al., Jpn. Ann. Rev. Electron. Comput. Telecommun. 19, 295 (1986)
H. Amano et al., Appl. Phys. Lett. 48, 353 (1986)
H. Amano et al., Thin Solid Films 163, 415 (1988)
H. Amano et al., Jpn. J. Appl. Phys. 28, L2112 (1989)
S. Nakamura et al., Jpn. J. Appl. Phys. 31, 1258 (1992)
S. Nakamura, Jpn. J. Appl. Phys. 30, L1705 (1991)
S. Nakamura et al., Jpn. J. Appl. Phys. 30, L1708 (1991)
S. Nakamura et al., Jpn. J. Appl. Phys. 31, L139 (1992)
S. Nakamura et al., Jpn. J. Appl. Phys. 30, L1998 (1991)
S. Nakamura et al., Appl. Phys. Lett. 64, 1687 (1994)
S. Nakamura et al., Jpn. J. Appl. Phys. 34, L797 (1995)
S. Nakamura et al., Jpn. J. Appl. Phys. 34, L1332 (1995)
T. Mukai et al., Jpn. J. Appl. Phys. 37, L839 (1998)
C.H. Carter Jr. et al., Mater. Sci. Eng. B 61–62, 1 (1999)
Compound Semiconductor 6, 11 (2000)
V. Harle et al., Phys. Status Solidi (A) 180, 5 (2000)
Compound Semiconductor 7, 7 (2001)
D. Eisert et al., Proceedings of the International Workshop on Nitride Semiconductors (IWN 2000), IPAP Conference Series 1 (2000), p. 841
U. Zehnder et al., J. Crystal Growth 230, 497 (2001)
J. Baur et al., Phys. Status Solidi (A) 194, 399 (2002)
U. Strauss et al., Phys. Status Solidi (C) 0, 276 (2002)
See Chap. 1 Part A in this book
See a review in O. Oda, Compound Semiconductor Materials and Characterization, vol. 2 (World Scientific Publ., 2012), p. 205
D. Hobgood et al., Mater. Sci. Forum 338–342, 3 (2000)
N. Ohtani et al., Mater. Sci. Forum 389–393, 29 (2002)
A.R. Powell et al., Mater Sci. Forum 457–460, 41 (2004)
J.J. Sumaeris et al., MRS Bull. 30, 280 (2005)
R.T. Leonard et al., Mater. Sci. Forum 600–603, 7 (2009)
Cree Research Inc., Industrial Session at the 8th European Conference on SiC Related Materials (ECSCRM2010, Norway, Oslo)
http://www.cree.com/~/media/Files/Cree/Chips-and-Material/Data-Sheets-Material/MATCATALOG.pdf
A. Krost, A. Dadgar, Mater. Sci. Eng. B 93, 77 (2002)
M. Akiyama et al., Jpn. J. Appl. Phys. 23, L843 (1984)
T. Egawa, Doctor thesis, Nagoya Institute of Technology (1991)
T. Egawa et al., Jpn. J. Appl. Phys. 37, 1552 (1998)
M. Umeno et al., Oyo Butsuri. Mon. Publ. Jpn. Soc. Appl. Phys. 72, 273 (2003)
Y. Nakada et al., Appl. Phys. Lett. 73, 827 (1998)
S.A. Nikishin et al., Appl. Phys. Lett. 75, 2073 (1999)
E. Calleja et al., J. Crystal Growth 201–202, 296 (1999)
F. Semond et al., Phys. Status Solidi (A) 188, 501 (2001)
F. Semond et al., Appl. Phys. Lett. 78, 335 (2001)
T. Takeuchi et al., J. Crystal Growth 115, 634 (1991)
A. Watanabe et al., J. Crystal Growth 128, 391 (1993)
W.J. Meng et al., J. Appl. Phys. 76, 7824 (1994)
S. Guha et al., Appl. Phys. Lett. 72, 415 (1998)
S. Guha et al., Appl. Phys. Lett. 723, 1487 (1998)
M.A. Sanchez-Garcia et al., J. Electron. Mater. 27, 276 (1998)
U. Kaiser et al., J. Mater. Res. 14, 2036 (1999)
C.A. Tran et al., Appl. Phys. Lett. 75, 1494 (1999)
D.D. Koleske et al., Appl. Phys. Lett. 75, 3141 (1999)
D.M. Follstaedt et al., MRS Internet J. Nitride Semicond. Res. 4S1, G3.72 (1999)
H. Lahreche et al., J. Crystal Growth 217, 13 (2000)
A. Dadger et al., Jpn. J. Appl. Phys. 39, L1183 (2000)
A.T. Schremer et al., Appl. Phys. Lett. 76, 736 (2000)
J.W. Yang et al., Appl. Phys. Lett. 76, 273 (2000)
E.K. Koh et al., J. Crystal Growth 218, 214 (2000)
S. Zamir et al., J. Crystal Growth 218, 181 (2000)
H. Machand et al., J. Appl. Phys. 89, 7846 (2001)
H. Lahreche et al., J. Crystal Growth 231, 329 (2001)
H.M. Liaw et al., Solid State Electron. 45, 417 (2001)
P.R. Hageman et al., Phys. Status Solidi (A) 188, 523 (2001)
P. Chen et al., J. Crystal Growth 225, 150 (2001)
P. Drechsel et al., J. Crystal Growth 315, 211 (2001)
J.D. Brown et al., Solid State Electron. 46, 1535 (2002)
F. Reihner et al., J. Crystal Growth 248, 563 (2003)
Y. Dikme et al., J. Crystal Growth 248, 578 (2003)
S. Lee et al., J. Crystal Growth 249, 65 (2003)
B.S. Zhang et al., J. Crystal Growth 258, 34 (2003)
Y. Lu et al., J. Crystal Growth 263, 4 (2004)
M. Wu et al., J. Crystal Growth 260, 331 (2004)
Y. Honda et al., Phys. Status Solidi (C) 2, 2125 (2005)
J.H. Yang et al., J. Crystal Growth 517, 5057 (2009)
X.Q. Shen et al., Phys. Status Solidi (C) 9, 503 (2012)
S. Ohkoshi et al., Tenth Record of Alloy Semiconductor Physics and Electronics Symposium, Nagoya (1991), p. 172
H. Ishikawa et al., J. Crystal Growth 189–190, 178 (1998)
H. Ishikawa et al., Phys. Status Solidi (A) 176, 599 (1999)
H. Ishikawa et al., Jpn. J. Appl. Phys. 336708, 39 (1999)
B.J. Hikosaka et al., Phys. Status Solidi (A) 188, 151 (2001)
N. Nishikawa et al., Technical Report IEICE, LQE 2001-142(2002-2), p. 37
T. Egawa et al., J. Appl. Phys. 91, 528 (2002)
A. Dadgar et al., Appl. Phys. Lett. 78, 2211 (2001)
M.H. Kim et al., Appl. Phys. Lett. 79, 2713 (2001)
T. Egawa et al., Jpn. J. Appl. Phys. 41, L663 (2002)
T. Egawa, ICN-5, Th-A8.1 (2003), p. 263
B. Zhang et al., Jpn. J. Appl. Phys. 42, L226 (2003)
T. Egawa et al., Technical Report IEICE, OPE-2003-202 (2003), p. 177
H. Ishikawa et al., Technical Report IEICE, ED2003-149 (2003), p. 291
T. Egawa, Taiyo-Nissan Technical Report, 23 (2004), p. 2
T. Egawa et al., IEEE Electron Device Lett. 26, 169 (2005)
T. Egawa, Wide Bandgap Semiconductors, ed. by K. Takahashi, A. Yoshikawa, A. Sandhu (Springer, 2007), p. 370
B. Zhang et al., Appl. Phys. Lett. 86, 071113 (2005)
N.R. Hashimoto et al., Mater. Res. Soc. Symp. 395, 243 (1996)
N.P. Kobayashi et al., Appl. Phys. Lett. 71, 3569 (1997)
N.P. Kobayashi et al., J. Crystal Growth 189–190, 172 (1998)
A. Strittmatter et al., Phys. Status Solidi (A) 176, 611 (1999)
L.S. Wang et al., Appl. Phys. Lett. 72, 109 (1998)
K.J. Lee et al., Appl. Phys. Lett. 85, 1502 (2004)
T. Riemann et al., J. Appl. Phys. 99, 123518 (2006)
J. Tolle et al., Appl. Phys. Lett. 82, 2398 (2003)
J. Tolle et al., Appl. Phys. Lett. 84, 3510 (2004)
C.-W. Hu et al., J. Crystal Growth 267, 554 (2004)
Y. Yamada-Takamura et al., Phys. Rev. Lett. 95, 266105 (2005)
T. Wang et al., J. Appl. Phys. 100, 033506 (2006)
A.H. Blake et al., J. Appl. Phys. 111, 033107 (2012)
O. Contreas et al., Appl. Phys. Lett. 81, 4712 (2002)
Y.X. Wu et al., Chin. Phys. B 18, 4413 (2009)
E. Feltin et al., Jpn. J. Appl. Phys. 40, L738 (2001)
S. Lee et al., J. Korean Phys. Soc. 46, 1356 (2004)
Y. Ni et al., Superlattices Microstruct. 83, 811 (2015)
X.Q. Shen et al., Phys. Status Solidi 11, 473 (2014)
B.A.B.A. Shunaimi et al., Mat. Res. Soc. Symp. Proc. 1167, O04-01 (2009)
B.A.B.A. Shunaimi et al., Jpn. J. Appl. Phys. 49, 021002 (2019)
T. Egawa et al., J. Phys. D Appl. Phys. 43, 354008 (2010)
K. Cheng et al., Appl. Phys. Lett. 92, 192111 (2008)
D. Zhu et al., Phys. Status Solidi (A) 209, 13 (2012)
H. Lahreche et al., Mater. Sci. Forum 338–342, 1487 (2000)
A. Strittmatter et al., Appl. Phys. Lett. 78, 727 (2001)
T. Decchprohm et al., Jpn. J. Appl. Phys. 40, L16 (2001)
R.F. Davis et al., J. Crystal Growth 231, 335 (2001)
T.M. Katona et al., Phys. Status Solidi (A) 194, 550 (2002)
T. Kato et al., J. Crystal Growth 237–239, 1099 (2002)
K.J. Kim et al., J. Korean Phys. Soc. 47, S500 (2005)
S. Zamir et al., Appl. Phys. Lett. 78, 288 (2001)
S. Zamir et al., J. Crystal Growth 230, 341 (2001)
S. Zamir et al., J. Appl. Phys. 81, 1191 (2001)
Z. Yang et al., Appl. Phys. Lett. 88, 041913 (2006)
B. Zhang et al., J. Crystal Growth 298, 725 (2007)
S.-J. Lee et al., Jpn. J. Appl. Phys. 47, 3070 (2008)
A. Dadgar et al., Phys. Status Solidi (A) 192, 308 (2002)
A. Dadger et al., Appl. Phys. Lett. 80, 3670 (2002)
J. Lee et al., J. Crystal Growth 315, 263 (2011)
T. Hossain et al., Phys. Status Solidi (C) 10, 425 (2013)
Y. Kawaguchi et al., Jpn. J. Appl. Phys. 37, L966 (1998)
Y. Kawaguchi et al., Phys. Status Solidi (A) 176, 553 (1999)
S. Tanaka et al., Appl. Phys. Lett. 76, 2701 (2000)
M. Seon et al., Appl. Phys. Lett. 76, 1842 (2000)
Y. Honda et al., J. Crystal Growth 230, 346 (2001)
S. Tanaka et al., Appl. Phys. Lett. 79, 955 (2001)
Y. Honda et al., J. Crystal Growth 242, 82 (2002)
Y. Honda et al., Appl. Phys. Lett. 80, 222 (2002)
Y. Honda et al., J. Crystal Growth 242, 77 (2002)
T. Narita et al., Phys. Status Solidi (C) 2, 2349 (2005)
T. Tanikawa et al., J. Crystal Growth 310, 4999 (2008)
T. Hikosaka et al., Phys. Status Solidi (C) 5, 2234 (2008)
T. Tanikawa et al., Phys. Status Solidi (C) 5, 2966 (2008)
T. Tanikawa et al., J. Crystal Growth 311, 2879 (2009)
M. Yang et al., J. Korean Phys. Soc. 54, 2363 (2009)
M. Yang et al., J. Crystal Growth 311, 2914 (2009)
N. Sawaki et al., J. Crystal Growth 311, 2867 (2009)
C.-H. Chiu et al., J. Crystal Growth 318, 500 (2011)
C.-H. Chiu et al., Appl. Phys. Exp. 4, 012105 (2011)
T. Murase et al., Jpn. J. Appl. Phys. 50, 01AD04 (2011)
T. Tanikkawa et al., Phys. Status Solidi (A) 208, 1175 (2011)
T. Mitsunarit et al., Phys. Status Solidi (C) 9, 480 (2012)
J. Song et al., Adv. Mater. Interfaces 2, 1500014 (2015)
D. Zubia et al., Appl. Phys. Lett. 76, 858 (2000)
D. Zubia et al., J. Vac. Sci. Technol. B 18, 3514 (2000)
S.D. Harsee et al., IEEE JQE 38, 1017 (2002)
J. Liang et al., Appl. Phys. Lett. 83, 1752 (2003)
X.Y. Sun et al., J. Appl. Phys. 95, 1450 (2004)
N.H. Zang et al., Appl. Phys. Lett. 87, 193106 (2005)
K.Y. Zang et al., Appl. Phys. Lett. 88, 141925 (2006)
L.S. Wang et al., Appl. Phys. Lett. 89, 011901 (2006)
Z. Yang et al., J. Vac. Sci. Technol. B 13, 789 (1995)
A.J. Steckl et al., Appl. Phys. Lett. 69, 2264 (1996)
J. Cao et al., Appl. Phys. Lett. 71, 3880 (1997)
J. Cao et al., J. Appl. Phys. 83, 3829 (1998)
A. Dadgar et al., Proc. SPIE 6355, 63550R (2006)
A. Ubukata et al., J. Crystal Growth 298, 198 (2007)
Y. Fu et al., J. Vac. Sci. Technol. A 18, 965 (2000)
E. Feltin et al., Appl. Phys. Lett. 79, 3230 (2001)
E. Feltin et al., Phys. Status Solidi (A) 188, 531 (2001)
J.A. Floro et al., MRS Bull. 27, 19 (2002)
E.F. Schubert, Light Emitting Diodes (Cambridge University Press, Cambridge, U.K., 2002)
H. Ishikawa et al., Phys. Status Solidi (A) 201, 2653 (2004)
H. Ishikawa et al., J. Crystal Growth 272, 322 (2004)
S.J. Lee et al., Appl. Phys. Exp. 4, 066501 (2011)
W.S. Wong et al., Appl. Phys. Lett. 77, 2822 (2000)
A. Dadger et al., IPAP Conf. Ser. 1, 845 (2000)
A. Dadgar et al., Phys. Status Solidi (A) 188, 155 (2001)
F. Reiner et al., J. Phys. D 42, 055107 (2009)
J. Wei et al., Jpn. J. Appl. Phys. 49, 072104 (2010)
A. Krost et al., Phys. Status Solidi (A) 194, 361 (2002)
A. Krost et al., Phys. Status Solidi (A) 200, 26 (2003)
Nikkei, Nov. 22 (2001)
Q. Sun et al., IEEE ChinaSSL, 174 (2013)
Q. Sun, J. Semiconductors 37, 044006 (2016)
S. Lenci et al., IEEE Electron Dev. Lett. 34, 10.35.417 (2013)
L.M. Kyaw et al., ECS Solid State Lett. 3, Q5 (2014)
http://www.eetindia.co.in/ART_8800644758_1800010_NP_0f814454.HTM
http://www.electroiq.com/articles/sst/2011/06/gan-on-si-hb-led-demo.html
See a review in O. Oda, Compound Semiconductor Materials and Characterization (World Scientific Publ., 2007), p. 27
J.I. Pankove, E.A. Miler, J.E. Berkeyheiser, RCA Rev. 32, 383 (1971)
S. Yoshida, S. Misawa, S. Gonda, Appl. Phys. Lett. 42, 427 (1983)
H.P. Maryska, J.J. Tietjen, Appl. Phys. Lett. 15, 327 (1969)
S. Nakamura, S.F. Chichibu, Introduction to Nitride Semiconductor Blue Lasers and Light Emitting Diodes (Taylor and Francis, London, 2000)
S.D. Lester et al., Appl. Phys. Lett. 66, 1249 (1995)
Y. Narukawa et al., Appl. Phys. Lett. 70, 981 (1997)
L. Sugiura, Appl. Phys. Lett. 70, 1317 (1997)
T. Egawa et al., Appl. Phys. Lett. 81, 292 (2002)
T. Sasaki et al., Appl. Surf. Sci. 41, 504 (1989)
S.Y. Ren, J.D. Dow, Appl. Phys. Lett. 69, 251 (1996)
M. Horie et al., Phys. Status Solidi (A) 192, 151 (2002)
A. Hashimoto et al., J. Crystal Growth 175–176, 129 (1997)
R. Graupner et al., J. Crystal Growth 217, 55 (2000)
A. Munkholm et al., Appl. Phys. Lett. 77, 1626 (2000)
M.K. Sankara et al., Appl. Phys. Lett. 79, 1546 (2001)
I.-H. Lee et al., J. Crystal Growth 235, 73 (2002)
X.H. Wu et al., Appl. Phys. Lett. 72, 692 (1998)
Y. Sun et al., Appl. Phys. Lett. 87, 093115 (2005)
D. Chisty et al., Appl. Phys. Express 6, 026501 (2013)
S. Nunoue et al., IEDM2013-349, 13.2.1 (2013)
T. Hikosaka et al., Phys. Status Solidi (C) 11, 617 (2014)
T. Hikosaka et al., J. Appl. Phys. 101, 103513 (2007)
B. Leung et al., Phys. Status Solidi (C) 11, 437 (2014)
L. Zhang et al., J. Electron. Dev. Soc. 3, 457 (2015)
M. Wosko et al., J. Crystal Growth 414, 248 (2015)
F. Semond, MRS Bull. 40, 412 (2015)
Y. Chubachi et al., Thin Solid Films 122, 259 (1984)
W.J. Meng et al., 59, 2097 (1991)
K.S. Stevens et al., Appl. Phys. Lett. 65, 321 (1994)
P. Kung et al., Appl. Phys. Lett. 66, 2958 (1995)
H.J. Wen et al., J. Vac. Sci. Technol. A 13, 2399 (1995)
E. Calleja et al., J. Appl. Phys. 82, 4681 (1997)
A. Bourret et al., J. Appl. Phys. 83, 2003 (1998)
H.P.D. Schnek et al., J. Crystal Growth 201/202, 359 (1999)
M.H. Kim et al., Appl. Phys. Lett. 78, 2858 (2001)
D. Xi et al., Phys. Status Solidi (A) 191, 137 (2002)
R. Liu et al., Appl. Phys. Lett. 83, 860 (2003)
K.Y. Zang et al., Phys. Status Solidi (C) 0, 2067 (2003)
K.Y. Zang et al., J. Crystal Growth 268, 515 (2004)
F. Schulze et al., J. Crystal Growth 272, 496 (2004)
G.P. Dimitrakopulos et al., Phys. Status Solidi (B) 242, 1617 (2005)
G. Radtke et al., Appl. Phys. Lett. 97, 251901 (2010)
G. Radtke et al., Appl. Phys. Lett. 100, 011910 (2012)
Y. Dai et al., J. Crystal Growth 435, 76 (2016)
S. Kaiser et al., J. Vac. Sci. Technol. B 18, 733 (2000)
Y. Han et al., J. Crystal Growth 434, 123 (2016)
H. Bin-Bin et al., Acta Phys. Sin. 64, 177804 (2015)
T. Yamaguchi et al., Phys. Stat. Sol. (c) 1–4 (2013)
Y. Kawai et al., ISPlasma2013 (Nagoya Univ., March), Tup-B06OB
S. Chen et al., Jpn. J. Appl. Phys. 52, 021001 (2013)
Y. Tsutsumi et al., ISPlasma 2014 (Nagoya Univ., March) 06aP46
H. Kondo et al., Proceedings of 7th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials/8th International Conference on Plasmȧ Nanotechnology and Science, (Nagoya University, Aichi, Japan, 2015), B1-I-01
Y. Cordier et al., Proceedings of 18th European Molecular Beam Epitaxy Workshop (Canazei, Italy, 2015) Tu1.4
O. Oda et al., Proceedings 3rd International Conference on Advanced Electronic Materials (ICAE2015) (ICC JeJu, Korea, 2015)
K.-C. Shen et al., Opt. Express 21, 26468 (2013)
S. Bakalova et al., Vacuum 84, 155 (2010)
H. Takahashi et al., Thin Solid Films 457, 114 (2004)
S. Zembutsu, T. Sasaki, Appl. Phys. Lett. 48, 870 (1986)
S.W. Choi et al., J. Mater. Res. 8, 847 (1993)
M. Sato, J. Appl. Phys. 78, 2123 (1995)
M. Sato, Appl. Phys. Lett. 68, 935 (1996)
C. Sone et al., Mater. Res. Soc. Symp. Proc. 449, 95 (1997)
J. Wang et al., J. Crystal Growth 177, 181 (1997)
T. Tokuda et al., J. Crystal Growth 173, 237 (1997)
T. Tokuda et al., J. Crystal Growth 183, 62 (1998)
C. Sone et al., J. Crystal Growth 189(190), 321 (1998)
W-C. Lai et al., Jpn. J. Appl. Phys. Part 1 37, 5465 (1998)
M. Losurdo et al., Phys. Status Solidi A 176, 733 (1999)
Y-K. Pu et al., Surf. Coat. Technol. 131, 470 (2000)
A. Wakahara et al., J. Crystal Growth 221, 305 (2000)
R.A. Sugianto et al., J. Crystal Growth 221, 311 (2000)
A. Subagio et al., Proc. ITB 33, 1 (2001)
R. P. Campion et al., Phys. Status Solidi A 188, 663 (2001)
C. Martin et al., Proc. SPIE 6894, 689407 (2008)
S. Fu et al., J. Crystal Growth 311, 3325 (2009)
S. Fu et al., Vacuum 86, 1517 (2012)
Y. Lu et al., J. Crystal Growth 391, 97 (2014)
H-Y. Shih et al., Nanotechnology 26, 014002 (2015)
T. Mitsunari et al., J. Crystal Growth 431, 60 (2015)
J.W. Shon et al., Sci. Rep. 4, 5325 (2014)
C.-C. Li, D.-H. Kou, J. Mater. Sci. 25, 1404 (2014)
Z.X. Zang et al., J. Alloys Comp. 467, 61 (2009)
H.W. Kim, N.H. Kim, Appl. Surf. Sci. 236, 192 (2004)
C.-C. Li, D.-H. Kou, J. Mater. Sci. 25, 1942 (2014)
T. Yamada et al., Jpn. J. Appl. Phys. 52, 08JB16 (2013)
D.M.G. Leite et al., Braz. J. Phys. 36, 978 (2006)
T. Kumada et al., Phys. Status Solidi 3–4, 515 (2012)
K. Sato et al., Appl. Phys. Exp. 2, 011003 (2009)
C.G. Zhang et al., J. Crystal Growth 299, 268 (2007)
E.C. Knox-Davies et al., J. Appl. Phys. 99, 073503 (2006)
T. Miyazaki et al., J. Appl. Phys. 97, 093516 (2005)
Y. Daigo, N. Mutsukura, Thin Solid Films 483, 38 (2005)
E.C. Knox-Davies et al., Diam. Rel. Mater. 12, 1417 (2003)
T. Kikuma et al., Vacuum 66, 233 (2002)
J. Lee et al., J. Korean Phys. Soc. 67, 1838 (2015)
H. Ishikawa et al., Jpn. J. Appl. Phys. 42, 6413 (2003)
K. Orita et al., IEEE J. Quant. Electron. 44, 151 (2008)
X. Zou et al., IEEE Trans. Electron Dev. 63, 1587 (2016)
H. Li et al., Appl. Phys. Express 9, 042101 (2016)
Y. Sun et al., Nat. Photonics (2016). doi:10.1038/nphoton.2016.158
D. Zhu et al., Rep. Prog. Phys. 76, 106501 (2013)
A. Dadger, Phys. Status Solidi (B) 252, 1063 (2015)
Acknowledgements
This work was partially supported by a Special Coordination Funds for Promoting Science and Technology.
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2017 Springer Nature Singapore Pte Ltd.
About this chapter
Cite this chapter
Egawa, T., Oda, O. (2017). LEDs Based on Heteroepitaxial GaN on Si Substrates. In: Seong, TY., Han, J., Amano, H., Morkoç, H. (eds) III-Nitride Based Light Emitting Diodes and Applications. Topics in Applied Physics, vol 133. Springer, Singapore. https://doi.org/10.1007/978-981-10-3755-9_3
Download citation
DOI: https://doi.org/10.1007/978-981-10-3755-9_3
Published:
Publisher Name: Springer, Singapore
Print ISBN: 978-981-10-3754-2
Online ISBN: 978-981-10-3755-9
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)