Abstract
222–351 nm AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs) are demonstrated, which have been achieved by the development of crystal growth techniques for wide-bandgap AlN and AlGaN. Significant increases in internal quantum efficiency (IQE) have been achieved for AlGaN quantum well (QW) emissions by introducing low-threading-dislocation density (TDD) AlN grown by an NH3 pulsed-flow multilayer growth method. Electron Injection efficiency (EIE) of the DUV LED was significantly increased by introducing multi-quantum barrier (MQB). Light extraction efficiency (LEE) was also improved by using a transparent p-AlGaN contact layer. The maximum external quantum efficiency (EQE) was increased up to 10.8% for a 276 nm DUV LED.
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Hirayama, H., Kamata, N., Tsubaki, K. (2017). AlGaN-Based Deep-Ultraviolet Light-Emitting Diodes. In: Seong, TY., Han, J., Amano, H., Morkoç, H. (eds) III-Nitride Based Light Emitting Diodes and Applications. Topics in Applied Physics, vol 133. Springer, Singapore. https://doi.org/10.1007/978-981-10-3755-9_10
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