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Bias Effect on Deposition Behaviour of Charged Nanoparticles

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Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes

Part of the book series: Springer Series in Surface Sciences ((SSSUR,volume 60))

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Abstract

If CNPs are generated in the CVD process, it is expected that the deposition behaviour would be affected by the electric field, which can be achieved by applying the bias to the substrate.

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Authors and Affiliations

  1. Department of Material Science and Engineering, Seoul National University, Seoul, Korea (Republic of)

    Nong Moon Hwang

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  1. Nong Moon Hwang
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Correspondence to Nong Moon Hwang .

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Hwang, N.M. (2016). Bias Effect on Deposition Behaviour of Charged Nanoparticles. In: Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes. Springer Series in Surface Sciences, vol 60. Springer, Dordrecht. https://doi.org/10.1007/978-94-017-7616-5_12

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