Abstract
The interest in radio-frequency (RF) capacitively coupled plasmas (CCP) is stipulated by the wide use of this discharge in plasma aided materials processing industry and analytical chemistry. In this paper the results of modelling of CCP in planar geometry at pressures of several torrs are reported. The steep increase of plasma density in the discharge centre with current density is investigated numerically at α — γ transition. It has been shown that the main reason for this is the non-locality of γ-electron ionization.
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© 1999 Springer Science+Business Media Dordrecht
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Berezhnoi, S., Kaganovich, I., Bogaerts, A., Gijbels, R. (1999). Modelling of Radio Frequency Capacitively Coupled Plasma at Intermediate Pressures. In: Schlüter, H., Shivarova, A. (eds) Advanced Technologies Based on Wave and Beam Generated Plasmas. NATO ASI Series, vol 67. Springer, Dordrecht. https://doi.org/10.1007/978-94-017-0633-9_48
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DOI: https://doi.org/10.1007/978-94-017-0633-9_48
Publisher Name: Springer, Dordrecht
Print ISBN: 978-90-481-5191-2
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