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Coalescence of Nanoscale Islands during Polycrystalline Thin Film Growth

  • Max O. Bloomfield
  • Yeon Ho Im
  • Hanchen Huang
  • Timothy S. Cale
Conference paper
Part of the Solid Mechanics and Its Applications book series (SMIA, volume 114)

Abstract

We describe a simulation framework designed to track individual grains in a material during simulations of their formation and processing. The framework employs a “grain continuum” model of films [Cale et al., Comp. Mat. Sci. 23 (3), (2002)] and can be used to complement discrete atomistic simulations, and link their results to continuum simulations. We demonstrate the use of multiplelevelset methods to track islands nucleated on substrates, during growth and impingement to form polycrystalline films. We briefly discuss how this simulation tool might be used in an integrated multiscale process simulation environment [Bloomfield et al., Electrochem. Soc. PV2001–24, pp.77–84, 2001] to establish a link from atomistic simulations upward to feature, pattern, and reactor scale simulations.

Key words

grain structure computer simulation level set methods multiscale 

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Copyright information

© Springer Science+Business Media New York 2004

Authors and Affiliations

  • Max O. Bloomfield
    • 1
  • Yeon Ho Im
    • 1
  • Hanchen Huang
    • 2
  • Timothy S. Cale
    • 1
  1. 1.Rensselaer: Interconnections for Gigascale IntegrationFocus Center - New YorkUSA
  2. 2.Department of Mechanical, Aerospace and Nuclear EngineeringRensselaer Polytechnic InstituteTroyUSA

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