Abstract
In March 1991 a very first slicing test was performed by a very large size wire saw on a multicristalline silicon ingot having a 30×30cm cross section. The purpose of the test was to establish whether good surface finish and acceptable total thickness variations was obtainable on 180 microns thick wafers with a wire penetration over a continuous length of 30cm of material and over a continuous depth of 30 cm neither of both operating conditions having ever been done before.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
E.N.E. 9th EC-PVSEC. Late New (Freiburg, 1989)
K. Shirasawa, 21st IEEE PVSC (Kyoto, 1990)
Kyocera Corp, 5th Int’l, PVSEC (Kyoto, 1990)
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1991 Springer Science+Business Media Dordrecht
About this paper
Cite this paper
Lievens, P.P., de Villers Grandchamps, T., Smekens, E.A., Smekens, G.R. (1991). Slicing, Cleaning and Etching thin 30×30cm wafers of Multicristalline Silicon. In: Luque, A., Sala, G., Palz, W., Dos Santos, G., Helm, P. (eds) Tenth E.C. Photovoltaic Solar Energy Conference. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-3622-8_355
Download citation
DOI: https://doi.org/10.1007/978-94-011-3622-8_355
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-5607-6
Online ISBN: 978-94-011-3622-8
eBook Packages: Springer Book Archive