Abstract
A new analysis approach which combines photoconductivity and photothermal deflection spectroscopies in a-Si:H is presented. An exponential distribution of defect states along the film is assumed, in agreement with recent experimental and theoretical results. Fits of experimental data in 1–3 eV energy range allow to profile electronic defects.
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© 1991 Springer Science+Business Media Dordrecht
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Amato, G. (1991). A New Approach for Characterizing Surface Interface and Bulk Defects in a-Si:H. In: Luque, A., Sala, G., Palz, W., Dos Santos, G., Helm, P. (eds) Tenth E.C. Photovoltaic Solar Energy Conference. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-3622-8_33
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DOI: https://doi.org/10.1007/978-94-011-3622-8_33
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