Abstract
The effect of N2 gas pressure on the sintering of silicon nitride-based ceramics (α and ß sialon) is examined. When gas pressure is low, reactions occur between Si3N4 and oxides and dense compacts are not obtained. Using the gas-pressure sintering method, dense compacts are produced at an elevated N2 gas pressure. However, N2 gas pressures higher than 10 MPa result in lower density because high pressure gas inside the closed pores inhibits densification in the final stage of sintering. These results suggest that silicon nitride-based materials should be sintered at an appropriate gas pressure to minimize thermal decomposition and to promote shrinking after pore closure. A gas-pressure sintering map is proposed for sintering silicon nitride-based ceramics under suitable gas pressure and temperature conditions.
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© 1992 Elselvier Science Publishers Ltd
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Hirosaki, N., Okada, A. (1992). Gas-Pressure Sintering Map for Silicon Nitride-Based Materials. In: Koizumi, M. (eds) Hot Isostatic Pressing— Theory and Applications. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-2900-8_23
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DOI: https://doi.org/10.1007/978-94-011-2900-8_23
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-85166-744-4
Online ISBN: 978-94-011-2900-8
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