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Application of Amorphous Hydrogenated Carbon Coating to Semiconductor Radiation Detectors

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Wide Band Gap Electronic Materials

Part of the book series: NATO ASI Series ((ASHT,volume 1))

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Abstract

The real surfaces of the high-resistivity p-type silicon and surfaces coated by a-C:H films have been investigated. It has been found that the natural oxide behaves as tunnel isolator stored charge near the surface. Just owing to this the surface of p-type Si can become a strong n-type semiconductor at the liquid nitrogen temperature. The resistivity of this n-channel depends on the cool condition.

It has been shown that a-C:H coating can be to produce stable semiconductor radiation detectors.

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© 1995 Springer Science+Business Media Dordrecht

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Kotina, I.M. et al. (1995). Application of Amorphous Hydrogenated Carbon Coating to Semiconductor Radiation Detectors. In: Prelas, M.A., Gielisse, P., Popovici, G., Spitsyn, B.V., Stacy, T. (eds) Wide Band Gap Electronic Materials. NATO ASI Series, vol 1. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-0173-8_30

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  • DOI: https://doi.org/10.1007/978-94-011-0173-8_30

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-4078-5

  • Online ISBN: 978-94-011-0173-8

  • eBook Packages: Springer Book Archive

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