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Nanoscale Fabrication

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Ultimate Limits of Fabrication and Measurement

Part of the book series: NATO ASI Series ((NSSE,volume 292))

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Abstract

The Naval Research Laboratory (NRL) has a number of innovative research programs to fabricate and characterize novel nanostructures. The resolution of relatively standard electron lithographic methods may be enhanced with modifications to the lithographic process. Lithographic techniques with electrons and X-Rays on very thin layer and monomolecular layer resists show promise for high resolution. Side-wall etching has produced 30 nm dimensions in the lateral direction, along with some unusual structures of interest. Techniques utilizing nanochannel glass promise to offer a source of uniform quantum wires and dots. These evolving techniques offer fabrication tools suitable for numerous studies.

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Author information

Authors and Affiliations

  1. Naval Research Laboratory, Washington, DC, 20375-5321, USA

    W. M. Tolles

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  1. W. M. Tolles
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Editor information

Editors and Affiliations

  1. Department of Engineering, The University of Cambridge, Cambridge, UK

    M. E. Welland

  2. IBM Research Division, Zurich Research Laboratory, Rüschlikon, Switzerland

    J. K. Gimzewski

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© 1995 Springer Science+Business Media Dordrecht

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Tolles, W.M. (1995). Nanoscale Fabrication. In: Welland, M.E., Gimzewski, J.K. (eds) Ultimate Limits of Fabrication and Measurement. NATO ASI Series, vol 292. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-0041-0_2

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  • DOI: https://doi.org/10.1007/978-94-011-0041-0_2

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-4023-5

  • Online ISBN: 978-94-011-0041-0

  • eBook Packages: Springer Book Archive

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