Abstract
The growing interest in developing techniques to prepare ultrathin semiconductor nanoparticle films is motivated by the size-dependent electronic and optical properties of semiconductors, which lead to a range of potential applications in electronic and optoelectronic devices, solar cells, photoelectrodes, photocatalysts, and sensors. The wet chemical synthesis of ultrathin semiconductor films represents, in principle, a simple and inexpensive alternative to more technologically demanding chemical vapor deposition (CVD) and physical techniques [1]. However, the realization of practical devices from wet chemical synthesis requires the development of film growth techniques that give similar or better quality films than vapor-phase methods. In particular, precise control of film thickness, crystallinity, and morphology are significant problems to be overcome in wet chemical synthesis.
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Kovtyukhova, N.I. et al. (2000). Self-Assembly of Nanoblocks and Molecules in Optical Thin-Film Nanostructures. In: Pavesi, L., Buzaneva, E. (eds) Frontiers of Nano-Optoelectronic Systems. NATO Science Series, vol 6. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0890-7_22
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DOI: https://doi.org/10.1007/978-94-010-0890-7_22
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