Abstract
There is growing interest in producing thin film lithium batteries for microelectronic applications. The vanadium pentoxide (V2O5) is a compound of high interest having found use in a wide range of applications. Among them is its use as a rechargeable cathodic material in lithium batteries. V2O5 thin films were deposited by several methods (sol-gel, sputtering, chemical vapor deposition and pulse-laser deposition) [1-4]. In this study, we use for the first time the atomic layer chemical vapor deposition (ALCVD) as deposition method for V2O5 films.
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Mantoux, A. et al. (2002). Structural and Electrochemical Properties of V2O5 Thin Films Obtained by Atomic Layer Chemical Vapor Deposition (ALCVD). In: Julien, C., Pereira-Ramos, J.P., Momchilov, A. (eds) New Trends in Intercalation Compounds for Energy Storage. NATO Science Series, vol 61. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0389-6_42
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DOI: https://doi.org/10.1007/978-94-010-0389-6_42
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