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Photochemical Vapour Deposition of Thin Films

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Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Part of the book series: NATO Science Series ((NAII,volume 55))

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Abstract

These lectures cover an aspect of energy-assisted chemical vapour deposition (CVD) that involves the use of light, either in the UV or visible, to bring about some beneficial change in the deposition process. This can entail an enhancement in deposition rate or an improvement in film quality such as density, composition or reduced defect concentration. The range of materials covered in these lectures will include oxides, semiconductors and metals. The interaction of light with either the precursor vapour or the substrate can enable a stimulation of the precursor reaction by a number of different mechanisms that will be explored in these lectures. The practical realisation of photo-assisted CVD can be complex but improved light sources and reactor designs now offers a wider choice in achieving a practical system. The choice of light sources, precursors and reaction chambers will be covered in some depth.

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Authors and Affiliations

  1. Department of Chemistry, University of Wales, Bangor Gwynedd, LL57 2UW, UK

    S. J. C. Irvine

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  1. S. J. C. Irvine
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Editors and Affiliations

  1. School of Electrochemical and Electrometallurgical Engineering, National Polytechnic Institute of Grenoble, Grenoble, France

    Yves Pauleau

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Irvine, S.J.C. (2002). Photochemical Vapour Deposition of Thin Films. In: Pauleau, Y. (eds) Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies. NATO Science Series, vol 55. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0353-7_9

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  • DOI: https://doi.org/10.1007/978-94-010-0353-7_9

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-1-4020-0525-1

  • Online ISBN: 978-94-010-0353-7

  • eBook Packages: Springer Book Archive

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