Abstract
One of the most probable ways towards silicon laser runs across solution of a complicated problem of material science — development of a reproducible technology for producing heterostructures with ultimately small-sized Ge quantum dots in Si. Dramatic progress has been already made in creating Si-based light-emitting diodes with Ge nanocrystalls incorporated into Si matrix (see for example Ref. [1]). These are called “Hut” and “Dome” — clusters. A great deal of recent research pursued in this field is focused on investigation of self-assembling processes of Ge nanocrystals by Stranski- Krastanov mechanism and effect of their self-ordering during heteroepitaxy. In this investigation attempts are made to find the ways for fabricating heterosystems with the smallest size of nanocrystalls and the highest degree of self-ordering of their ensembles in a substrate plane and in their dimensional homogeneity [2]. Recent record in minimizing nanocrystal size using a thin silicon oxide submonolayer is reported in Ref. [5]. Some data on the degree of GeSi cluster ordering on Si are also presented in Ref. [6]. However, it should be noted that clusters of minimal size (but no less than 10 nm) turn out to be poorly ordered whereas ordered clusters are large in size.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Vescan, L., Stoica, T., Chretien, O., Goryll, M., Mateeva, E. and Muck A. (2000) Size distribution and electroluminescence of self-assembled Ge dots, J. of Applied Physics, 87, 7275–7282.
Bimberg, D., Heinrichsdorff, F., Ledentsov, N.N., Shchukin, V.A. (2000) Self-organized growth of semiconductor nanostructures for novel light emitters, Applied Surface Science 159-160, 1–7.
Pchelyakov, O.P., Bolkhovityanov, Yu.B., Dvurechenskii, A.V., Nikiforov, A.I., Yakimov, A.I., Voigtlander, B. (2000) Molecular beam epitaxy of silicon-germanium nanostructures, Thin Solid Films 367, 75–84.
Brunner, K. (2002) Si/Ge nanostructures, Reports on Progress in Physics 65, 27–72.
Shklyaev, A.A., Shibata, M. and Ichikawa, M. (2000) High-density ultrasmall epitaxial Ge islands on Si(111) surfaces with a SiO2 coverage, Phisical Review B 62, 1540–1543.
Zhu, J., Brunner, K., Abstreiter, G., Kienzle, O., Ernst, F. (1998) Lateral ordering of self-assembled Ge islands Thin Solid Films, 336, 252–255
Goldfarb, I. and Briggs, G.A.D. (1999) Comparative STM and RHEED studies of Ge/Si(001) and Si/Ge/Si(001) surfaces, Surface Science, 433-435, 449–454.
Pchelyakov, O.P., Markov, V.A., Nikiforov, A.I., Sokolov, L.V. (1997) Surface processes and phase diagrams in MBE growth of Si/Ge heterostuctures, Thin Solid Films 306, 299–306.
Kubler, L., Dentel, D., Bischoff, J.L., Ghica, C., Ulhag-Bouillet, C., and Werckmann, J. (1998) Si adatom surface migration biasing by elastic strain gradients during capping of Ge or Sij-x Gex hut islands, Appl.Phys.Lett., 73, 1053–1055.
Ohtake, A., Ozeki, M., and Nakamura, J. (2000) Strain relaxation in InGa/GaAs(111)A heteroepitaxy, Phys.Rev.Lett., 84, 4665–4668.
Grandjian, N. and Massies, J. (1993) Epitaxial growth of highly strained InxGal-xAs on GaAs(OOl) — The role of surface diffusion length, J. Crystal Growth, 134, 51–62.
Turban, P., Hennet, L., Andrieu, S. (2000) In-plane lattice spacing oscillatory behavior during the two-dimensional hetero-and homoepitaxy of metals, Surface Science. 446, 241–253
Vostokov, N.V., Dolgov, I.V., Drozdov, Yu.N. and Krasilnik, Z.F. (2000) The uniform nanoislands Ge on Si(001), Izv. Acad. Nauk Fiz. 64, 284–287.
Sokolov, L.V., Stenin, S.I., Toropov, A.I., Pchelyakov, O.P. (1997) Superstructure transformation on a Ge surface during molecular beam epitaxy of Ge on Si(111), Surface Investigation 12, 1151–1157.
Nikiforov, A.I., Markov, V.A., Cherepanov, V.A., Pchelyakov, O.P. (1998) The influence of growth temperature on the period of RHEED oscillations during MBE of Si and Ge on Si(111) surface, Thin Solid Films 336, 183–187.
Nikiforov, A.I., Cherepanov, V.A., Pchelyakov, O.P., Dvurechenskii, A.V., Yakimov, A.I. (2000) In situ RHEED control of self-organized Ge quantum dots, Thin Solid Films 380, 158–163.
Pchelyakov, O.P., Bolkhovityanov, Yu.B., Nikiforov, A.I., Olshanetsky, B.Z., Teys, S.A. and Voigtlander, B. (2002) Atomistic aspects of SiGe nanostructure formation by molecular-beam epitaxy, in M. Kotrla et al. (eds.), Atomistic Aspects of Epitaxial Growth, Klüver Academic Publishers, Dordrecht, pp. 371–381.
Markov, V.A., Cheng, H.H., Chih-ta Chia, Nikiforov, A.I., Cherepanov, V.A., Pchelyakov, O.P., Zhuravlev, K.S., Talochkin, A.B., McGlynn, E., Henry, M.O. (2000) RHEED studies of nucleation of Ge islands on Si(001) and optical properties of ultra-small Ge quantum dots, Thin Solid Films 369, 79–83.
Teys, S. A. and Olshanetsky, B. Z. (2002) Formation of the wetting layer in Ge/Si(111) epitaxy at low growth rates studied with STM, Physics of Low-Dimensional Structures 1/2, 37–46.
Koehler, U., Demuth, J.E., Hamers. R.J. (1989) Scanning tunneling microscopy study of low-temperature epitaxial growth of silicon on Si (111)-(7x7), J. Vac.Sci.Technol. A7, 2860–2867.
Fischer, A., Kuhne, H., Lippert, G., Richter, H. and Tillack, B. (1999) State of stress and critical thickness of strained small-area SiGe layers, Phys. stat. sol. (a) 171 475–485.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2003 Springer Science+Business Media Dordrecht
About this chapter
Cite this chapter
Pchelyakov, O.P., Nikiforov, A.I., Olshanetsky, B.Z., Romanyuk, K.V., Teys, S.A. (2003). Mbe Of Si — Ge Heterostructures With Ge Nanocrystals. In: Pavesi, L., Gaponenko, S., Dal Negro, L. (eds) Towards the First Silicon Laser. NATO Science Series, vol 93. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0149-6_27
Download citation
DOI: https://doi.org/10.1007/978-94-010-0149-6_27
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-1194-8
Online ISBN: 978-94-010-0149-6
eBook Packages: Springer Book Archive