Abstract
VLSI technology is aimed at maximizing the utilization of silicon area, electrical power, and costly production facilities, while providing high functional capability. Integration and miniaturization are the routes by which this is accomplished. Progress in integration and miniaturization involves solving a continual series of technological problems in lithography and chemical process technology.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
R. W. Keyes, IEEE J. Solid State Circuits 14, 193–201 (1979).
G. Moore, Technical Digest 1975 International Electron Device Meeting (IEEE, New York, 1975) pp. 11–13.
G. Marr, Fall Compcon 77 Digest (IEEE, New York, 1977) pp. 242–244.
R. W. Keyes, Proc. IEEE 69, 267–278 (1981).
E. Demoulin, et al, Technical Digest 1979 International Electron Devices Meeting (IEEE, New York, 1979) pp. 34–37.
R. W. Keyes, Appl. Phys. 8, 251–159 (1975).
E. O. Johnson, IEEE Trans. Electr. Dev. 22, 1044–1045 (1975).
T. C. May, Proc. 29th Electronic Components Conference (IEEE, New York, 1979) pp. 247–256.
J. F. Ziegler and W. A. Lanford, Science 206, 776–788 (1979).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1982 Martinus Nijhoff Publishers, The Hague
About this paper
Cite this paper
Keyes, R.W. (1982). LSI: Prospects and Problems. In: Esaki, L., Soncini, G. (eds) Large Scale Integrated Circuits Technology: State of the Art and Prospects. NATO Advanced Study Institutes Series, vol 55. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-7645-0_2
Download citation
DOI: https://doi.org/10.1007/978-94-009-7645-0_2
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-009-7647-4
Online ISBN: 978-94-009-7645-0
eBook Packages: Springer Book Archive