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Polymers for Semiconductor Processing

Chapter

Abstract

In many applications of polymers their susceptibilities to degradation or embrittlement by radiation and attack by some solvents are considered shortcomings. In lithographic applications, however, these properties are used to advantage. The processing of semiconductors is achieved entirely by the selective degradation or crosslinking of polymeric coatings and each step of etching, doping, passivation or interconnection of the substrate is carried out using this imaged protective coating or resist. The patterning of the resist is usually conducted by a photographic process using near ultra-violet light, followed by selective dissolution of either exposed or unexposed areas.

Keywords

Negative Photoresist Semiconductor Processing Positive Photoresist Novolac Resin Flood Exposure 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Elsevier Applied Science Publishers Ltd. 1985

Authors and Affiliations

  1. 1.Plessey Research (Caswell) LtdCaswell, TowcesterUK

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