Abstract
Silicon can be doped with electrically active donors (P, As, Sb) to levels exceeding solid-solubility limits by means of laser- or incoherent-light annealing techniques applied to ion-implanted, amorphized layers. Mössbauer spectroscopy utilizing additionally implanted (radioactive) probe atoms has been employed to characterize some properties of highly doped material. Recent examples are given of the type of microscopic information obtained from such studies.
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© 1988 Kluwer Academic Publishers
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Weyer, G. (1988). Applications of Mössbauer Spectroscopy to Characterize Highly Doped Semiconductors. In: Recknagel, E., Soares, J.C. (eds) Nuclear Physics Applications on Materials Science. NATO ASI Series, vol 144. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-2800-8_7
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DOI: https://doi.org/10.1007/978-94-009-2800-8_7
Publisher Name: Springer, Dordrecht
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