Abstract
The spatial variations of the I375.3 and I705.4 emission intensities related to the Ti and Ar excited states, respectively, have been investigated near the substrate surrounded by a guard ring which play the role of the anode in an argon magnetron discharge. A previous work related to experiments involving the substrate kept at ground potential has already been published (1). The scope of the present paper is more extended. We deal with largely variable experimental situations including negatively biased substrate cases as well.
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References
T. Pech, J.P. Chabrerie and A. Ricard: J. Vac. Sci. Technol. A 6, 2987 (1988).
S.M. Rossnagel: J. Vac. Sci. Technol. A 6, 19 (1988).
S.M. Rossnagel and H.R. Kaufman: J. Vac. Sci. Technol. A 6, 223 (1988).
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© 1990 Kluwer Academic Publishers
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Pech, T., Ricard, A. (1990). Ar and Ti Excited States in the Vicinity of the Substrate during Magnetron Sputtering of Ti. In: Auciello, O., Gras-Marti, A., Valles-Abarca, J.A., Flamm, D.L. (eds) Plasma-Surface Interactions and Processing of Materials. NATO ASI Series, vol 176. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1946-4_7
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DOI: https://doi.org/10.1007/978-94-009-1946-4_7
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-7369-1
Online ISBN: 978-94-009-1946-4
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