Abstract
This paper describes principles and practical applications of ion beam and plasma-induced etching for microcircuit fabrication, particularly in relation to etching of cadmium-mercury-telluride.
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References
Fischer K, Bazarre DF, Bell G, Kegel B and Liebel G: Fresenius Z Anal Chem, 1983.
Liebel G: Elektronik Produktion Prüftechnik, 1987.
Fischer K: US-Patent 4,128,467, 1978.
Kegel B: Elektronik Produktion Prüftechnik, 1987.
Liebel G and Bischoff R: Industrial & Production Engineering, 1987.
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© 1990 Kluwer Academic Publishers
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Fischer, K., Möhl, W. (1990). Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices. In: Auciello, O., Gras-Marti, A., Valles-Abarca, J.A., Flamm, D.L. (eds) Plasma-Surface Interactions and Processing of Materials. NATO ASI Series, vol 176. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1946-4_35
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DOI: https://doi.org/10.1007/978-94-009-1946-4_35
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-7369-1
Online ISBN: 978-94-009-1946-4
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