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Partial Pressure Analysis of CF4/O2 Plasmas

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Plasma-Surface Interactions and Processing of Materials

Part of the book series: NATO ASI Series ((NSSE,volume 176))

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Abstract

Recently, reactive low-pressure RF glow discharges (plasmas) have become indispensable tools in the fabrication of microelectronic devices. However, despite the widespread use of glow discharges, a fundamental understanding of gas-phase and surface reaction mechanisms is generally lacking. Many diagnostic techniques exist for plasma analysis including optical emission and absorption spectroscopy1,2, laser-induced fluorescence1,5, and mass spectroscopy3,4,6. Of these methods, mass-spectroscopy offers the advantages of simple yet sensitive detection of both intermediate radicals within the discharge (flux analysis) and stable discharge products downstream (partial-pressure analysis). In addition, the data may be easily quantified to yield reactant and product partial pressure information within the discharge.

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Author information

Authors and Affiliations

  1. Department of Chemical Engineering, University of California, Berkeley, CA, 94720, USA

    J. C. Martz & D. W. Hess

  2. Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, NM, 87545, USA

    W. E. Anderson

Authors
  1. J. C. Martz
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  2. D. W. Hess
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  3. W. E. Anderson
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Editor information

Editors and Affiliations

  1. Microelectronics Center of North Carolina, Research Triangle Park, North Carolina, USA

    Orlando Auciello

  2. North Carolina State University, Research Triangle Park, North Carolina, USA

    Orlando Auciello

  3. University of Alicante, Alicante, Spain

    Jose Antonia Valles-Abarca

  4. AT&T Bell Laboratories, Murray Hill, New Jersey, USA

    Daniel L. Flamm

  5. University of California, Berkeley, USA

    Daniel L. Flamm

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© 1990 Kluwer Academic Publishers

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Martz, J.C., Hess, D.W., Anderson, W.E. (1990). Partial Pressure Analysis of CF4/O2 Plasmas. In: Auciello, O., Gras-Marti, A., Valles-Abarca, J.A., Flamm, D.L. (eds) Plasma-Surface Interactions and Processing of Materials. NATO ASI Series, vol 176. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1946-4_13

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  • DOI: https://doi.org/10.1007/978-94-009-1946-4_13

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-7369-1

  • Online ISBN: 978-94-009-1946-4

  • eBook Packages: Springer Book Archive

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