Abstract
It has been the “proven truth” for some decades that the performance of electronic devices should rise with decreasing dimensions. The continuos advance of lithographic technology in the past made possible serious exploration of the fascinating world of low-dimensional structures and was in turn propelled by the results of this exploration. Today, the submicron lithography in combination with different growth techniques such as MBE and MOCVD is routinely used for fabrication of quantum-well based devices with superior characteristics.
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Tager, A.A. et al. (1996). Nonlithographic Fabrication and Physics of Nanowire and Nanodot Array Devices — Present and Future. In: Luryi, S., Xu, J., Zaslavsky, A. (eds) Future Trends in Microelectronics. NATO ASI Series, vol 323. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1746-0_15
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DOI: https://doi.org/10.1007/978-94-009-1746-0_15
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