Abstract
Materials processing with lasers in a chemically reactive atmosphere (LCP) is a new and interdisciplinary field. The technique permits maskless single-step patterning of materials by deposition, surface modification, synthesis and etching [1,2]. The lateral dimensions of the processed regions range from several centimeters to less than one micrometer. Contrary to conventional techniques such as chemical vapor deposition (CVD), plasma deposition (PCVD) or plasma etching (PE), reactive ion sputtering (RIE) etc., LCP is not limited to planar substrates, but allows three dimensional fabrication as well.
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© 1988 Martinus Nijhoff Publishers
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Bauerle, D., Szorenyi, T., Zhang, G.Q., Piglmayer, K., Eyett, M., Kullmer, R. (1988). Laser-Induced Chemical Processing of Materials. In: Ehrlich, D.J., Nguyen, V.T. (eds) Emerging Technologies for In Situ Processing. NATO ASI Series, vol 139. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1409-4_4
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DOI: https://doi.org/10.1007/978-94-009-1409-4_4
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