Abstract
X-ray lithography is a one-to-one shadow projection of an absorber structure on an X-ray transparent membrane onto a resist coated wafer. The typical arrangement is shown in Fig. 1. The X-ray radiation is provided by BESSY, the Berlin Electron Storage ring for SYnchrotron radiation. Synchrotron radiation is nearly parallel and is emitted by a well-defined electron beam. A proximity gap between mask and wafer protects the mask against mechanical damage.
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Reference
A. E. Adams, M. L. Lloyd, S. L. Morgan, N. G. Davis, in Laser Processing and Diagnostics, ed. D. Bäuerle, p. 269 (July 1984).
D. Bäuerle, in Surface Studies with Lasers, eds. F. R. Aussenegg, A. Leitner, M. E. Lippitsch, p. 178 (March 1983).
T. F. Deutsch, D. D. Rathman, Appl. Phys. Lett. 45 (6), p. 623 (1984).
D. J. Ehrlich, Solid State Technology, p. 81 (December 1985).
A. Heuberger, Solid State Technology, p. 93 (February 1986).
R. Solanki, P. K. Boyer, G.J. Collins, Appl. Phys. Lett. 41 (11), p. 1048 (1982).
R. Solanki, P. K. Boyer, J.E. Mahan, G.J. Collins, Appl. Phys. Lett. 38 (7), p. 572 (1981).
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© 1988 Martinus Nijhoff Publishers
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Putzar, R., Petzold, HC., Weigmann, U. (1988). Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks. In: Ehrlich, D.J., Nguyen, V.T. (eds) Emerging Technologies for In Situ Processing. NATO ASI Series, vol 139. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1409-4_18
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DOI: https://doi.org/10.1007/978-94-009-1409-4_18
Publisher Name: Springer, Dordrecht
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