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The Chemistry of Photoresists

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Book cover Photopolymerisation and Photoimaging Science and Technology

Abstract

Polymers and polymeric systems that can undergo imagewise light-induced reactions are of high research interest and technological importance. The process of forming images in photopolymers and then transferring these images into the substrate or to other materials is called photolithography. Traditionally, photolithography has had great commercial impact on the printing industry, photomachining of fine parts, and so on. More recently, the electronics revolution has been made possible by the photopolymers used to delineate the tiny features that make up modern integrated circuits. It is our objective in this chapter to discuss the chemistries of the photoresist polymers and polymeric systems used in photolithography. We will focus this chapter on microresists and microlithography for integrated circuit manufacture because of the high technological and scientific interest in this area and because of our known experiences and biases.

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Author information

Authors and Affiliations

  1. Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York, USA

    S. Richard Turner

  2. Electronics Research Laboratories, Eastman Kodak Company, Rochester, New York, USA

    Robert C. Daly

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  1. S. Richard Turner
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  2. Robert C. Daly
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Editors and Affiliations

  1. Department of Chemistry, Faculty of Science and Engineering, Manchester Polytechnic, Manchester, M1 5GD, UK

    Norman S. Allen BSc, PhD, DSc

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Turner, S.R., Daly, R.C. (1989). The Chemistry of Photoresists. In: Allen, N.S. (eds) Photopolymerisation and Photoimaging Science and Technology. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1127-7_3

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  • DOI: https://doi.org/10.1007/978-94-009-1127-7_3

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