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Pattern Formation during CW Laser Melting of Silicon

  • K. Dworschak
  • J. S. Preston
  • J. E. Sipe
  • H. M. Van Driel
Part of the NATO ASI Series book series (NSSE, volume 183)

Abstract

We summarize our recent experimental and theoretical work on the molten-solid morphologies which form during irradiation of thin Si films by a cw, ⋋ = 10.6µm laser. We have observed a variety of ordered and disordered patterns which depend on laser intensity, spot size, polarization and angle of incidence.

Keywords

Spot Size Pattern Formation Laser Intensity Solid Region Grating Structure 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Kluwer Academic Publishers 1990

Authors and Affiliations

  • K. Dworschak
    • 1
  • J. S. Preston
    • 1
  • J. E. Sipe
    • 1
  • H. M. Van Driel
    • 1
  1. 1.Department of PhysicsUniversity of Toronto and Ontario Laser and Lightwave Research CentreTorontoCanada

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